Optimized piranha etching process for SU8-based MEMS and MOEMS construction

Journal of Micromechanics and Microengineering

Volumn 20, Issue 11, 2010, Pages

  Holmes, Matthew ^a   Keeley, Jared ^a   Hurd, Katherine ^a   Schmidt, Holger ^b   Hawkins, Aaron ^a  

^a Department of Electrical and Computer Engineering   (United States)

^b University of California Santa Cruz   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIRESONANT REFLECTING OPTICAL WAVEGUIDES; CROSSLINKED; ETCHING PROCESS; FABRICATION MATERIALS; HIGH YIELD; HOLLOW STRUCTURE; MICRO OPTO ELECTRO MECHANICAL SYSTEMS; MICROELECTROMECHANICAL SYSTEMS; SU-8 POLYMER;

ETCHING; MICROELECTROMECHANICAL DEVICES; MIXTURES; OPTIMIZATION; REFRACTIVE INDEX; SILICON NITRIDE;

MOEMS;

EID: 78649734074     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/11/115008     Document Type: Article

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