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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 10 A, 2003, Pages

Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist

(7) Lee, Jaekul a Shin, Hyunjung b Kim, Sungdong c Hong, Seungbum c Chung, Juhwan c Park, Hongsik c Moon, Jooho a

a Yonsei University (South Korea)

b Kookmin University (South Korea)

c Samsung Advanced Institute of Technology (SAIT) (South Korea)

Author keywords

AFM; Cantilever; SAMs; Spring constant; SU 8

Indexed keywords

ETCHING; MONOLAYERS; NATURAL FREQUENCIES; PHOTOLITHOGRAPHY; PHOTORESISTS; SELF ASSEMBLY; SILICON; SILICON WAFERS; SUBSTRATES;

MICROFABRICATION PROCESS; SPRING CONSTANT;

ATOMIC FORCE MICROSCOPY;

EID: 0345376280 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.l1171 Document Type: Article

Times cited : (15)

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