Surface micromachining by sacrificial aluminium etching

Journal of Micromechanics and Microengineering

Volumn 6, Issue 4, 1996, Pages 376-384

  Westberg, David ^a   Paul, Oliver ^b   Andersson, Gert I ^a   Baites, Henry ^b  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

^b ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CMOS INTEGRATED CIRCUITS; HYDROCHLORIC ACID; HYDROGEN PEROXIDE; INTEGRATED CIRCUIT MANUFACTURE; MICROELECTROMECHANICAL DEVICES; MICROELECTRONIC PROCESSING; MICROMACHINING; PHOTORESISTS; THERMAL EFFECTS;

ETCH FRONTS; ETCH RATE; ETCH SOLUTION; KRUMM ETCH; METALLIZATION; MICROMECHANICAL STRUCTURES; SACRIFICIAL ALUMINIUM ETCHING; SURFACE MICROMACHINING;

ETCHING;

EID: 0030361491     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/4/004     Document Type: Article

References (26)

1. Linder C, Paratte L, Grétillat M-A, Jaecklin V P and de Rooij N F 1992 Surface micromachining J. Micromech. Microeng. 2 122-32
2. Howe R T 1988 Surface micromachining for microsensors and microactuators J. Vac. Sci. Technol. 6 1809-13
3. French P J 1996 J. Micromech. Microeng. 6 197-211
4. Monk D J, Soane D S and Howe R T 1994 LPCVD silicon dioxide sacrificial layer etching for surface micromachining MRS Symp. Proc. (MRS, Pittsburgh, 1994) 276 303-10
5. Monk D J, Soane D S and Howe R T 1992 A diffusion/chemical reaction model for HF etching of LPCVD phosphosilicate glass sacrificial layers IEEE Solid-State Sensor and Actuator Workshop (Hilton Head Island, SC, 1992) (New York: IEEE) pp 46-9
6. Monk D J, Soane D S and Howe R T 1994 Hydrofluoric acid etching of silicon dioxide sacrificial layers I. Experimental observations J. Electrochem. Soc. 141 264-9
7. Monk D J, Soane D S and Howe R T 1994 Hydrofluoric acid etching of silicon dioxide sacrificial layers II. Modeling J. Electrochem. Soc. 141 270-4
8. Liu J, Tai Y C, Lee J, Pong K C, Zohar Y and Ho C M 1993 In situ monitoring and universal modelling of sacrificial PSG etching using hydrofluoric acid Proc. IEEE Micro Electro Mechanical Systems (Fort Lauderdale, FL, 1993) (New York: IEEE) pp 71-6
9. Lin G, Kim C-J, Konishi S and Fujita H 1995 Design, fabrication, and testing of a c-shaped actuator Transducers '95 (Stockholm, Sweden, 1995) vol 2, pp 416-9
10. Suh J W, Storment C W and Kovacs G T A 1995 Characterization of multi-segment organic thermal actuators Transducers '95 (Stockholm, Sweden, 1995) vol 2, pp 333-6
11. Juan W H, Pang S W, Selvakumar A, Putty M W and Najafi K 1994 Using electron cyclotron resonance (ECR) source to etch polyimide molds for fabrication of electroplated microstructures IEEE Solid-State Sensor and Actuator Workshop (Hilton Head Island, SC, 1994) (New York: IEEE) pp 82-5
12. Putty M W and Najafi K A 1994 Micromachined vibrating ring gyroscopeIEEE Solid-State Sensor and Actuator Workshop (Hilton Head Island, SC, 1994) (New York: IEEE) pp 213-20
13. Putty M W A 1995 Micromachined vibrating ring gyroscope PhD Thesis University of Michigan Technical report No 245
14. Paul O and Baltes H 1995 Novel fully CMOS-compatible vacuum sensor Sensors Actuators A46-47 143-6
15. Paul O, Häberli A, Malcovati P and Baltes H 1994 Novel integrated thermal pressure gauge and read-out circuit by CMOS IC technology IEEE IEDM'94 (San Francisco, CA, 1994) (New York: IEEE) pp 131-4
16. Häberli A, Paul O, Malcovati P, Faccio M, Maloberti F and Baltes H 1996 CMOS integration of a thermal pressure sensor system Proc. IEEE ISCAS '96 (Atlanta, GA, 1996) vol 1 (New York: IEEE) pp 377-80
17. Etchant No. 11940 Soprelec SA, France
18. See etchants AL-0010 and AL-0014 in: Walker P and Tarn W H 1991 CRC Handbook of Metal Etchants (Boca Raton, FL: Chemical Rubber Company Press) pp 80-106
19. Walker P and Tarn W H 1991 CRC Handbook of Metal Etchants (Boca Raton, FL: Chemical Rubber Company Press) p 88
20. Meyer R J, Pietsch E H E, Kotowski A and Becke-Goehring M 1977 Gmelin Handbook of Inorganic Chemistry (Berlin: Verlag Chemie) vol 35A, p 369
21. Meyer R J, Pietsch E H E, Kotowski A and Becke-Goehring M 1977 Gmelin Handbook of Inorganic Chemistry (Berlin: Verlag Chemie) vol 35A p 389
22. Shipley Sales Brochure 1995 Microposit S1800 Series Photo Resists
23. Deal B E amd Grove A S 1965 General relationship for the thermal oxidation of silicon J. Appl. Phys. 36 3770-8
24. Howard A 1995 Shipley, private communication
25. Hurden M J and Averbach B L 1961 Acta Metall. 9 237-46
26. See etchants AL-0017a-b, AL-0059a, AL-0082b, AL-0098, and AL- 0103in: Walker P and Tarn W H 1991 CRC Handbook of Metal Etchants (Boca Raton, FL: Chemical Rubber Company Press) pp 80-106