Combinatorial analysis of plasma-surface interactions of poly(ethylene terephthalate) with X-ray photoelectron spectroscopy

Japanese Journal of Applied Physics

Volumn 49, Issue 8 PART 2, 2010, Pages

  Takenaka, Kosuke ^a,d   Cho, Ken ^a,d   Setsuhara, Yuichi ^a,d   Shiratani, Masaharu ^b,d   Sekine, Makoto ^c,d   Hori, Masaru ^c,d  

^a OSAKA UNIVERSITY   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

A-DENSITY; ARGON-OXYGEN MIXTURES; CHEMICAL BONDING STATE; COMBINATORIAL ANALYSIS; ION DOSE; ION SATURATION CURRENT; PET FILMS; PLASMA EXPOSURE TIME; PLASMA-SURFACE INTERACTIONS; RF-POWER; XPS;

ARGON; CHEMICAL BONDS; ETHYLENE; OXYGEN; PHOTOELECTRICITY; PHOTONS; PLASMA INTERACTIONS; POLYETHYLENE TEREPHTHALATES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77958085286     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.08JA02     Document Type: Article

References (22)

1. International Technology Roadmap for Semiconductors, 2007 edition, Executive summary.
2. L. Sansonnens, A. A. Howling, and Ch. Hollenstein: Plasma Sources Sci. Technol. 15 (2006) 302.
3. H. Wada, D. Lee, U. Krishnamoorthy, S. Zappe, and O. Solgaard: Jpn. J. Appl. Phys. 41 (2002) L899.
4. C.-Y. Lee, G.-W. Wu, and W.-J. Hsieh: Sens. Actuators A 147 (2008) 173.
5. C. Biasotto, J. A. Diniz, A. M. Daltrini, S. A. Moshkalev, and M. J. R. Monteiro: Thin Solid Films 516 (2008) 7777.
6. T. Ideno and T. Ichiki: Thin Solid Films 506-507 (2006) 235.
7. T. Ichiki, Y. Sugiyama, T. Ujiie, and Y. Horiike: J. Vac. Sci. Technol. B 21 (2003) 2188.
8. W. W. Jang, J.-B. Yoon, M.-S. Kim, J.-M. Lee, S.-M. Kim, E.-J. Yoon, K. H. Cho, S.-Y. Lee, I.-H. Choi, D.-W. Kim, and D. Park: Solid-State Electron. 52 (2008) 1578.
9. M. A. F. van den Boogaart, G. M. Kim, R. Pellens, J.-P. van den Heuvel, and J. Brugger: J. Vac. Sci. Technol. B 22 (2004) 3174.
10. E. Thiénot, F. Domingo, E. Cambril, and C. Gosse: Microelectron. Eng. 83 (2006) 1155.
11. T. Yamada, T. Uezono, K. Okada, K. Masu, A. Oki, and Y. Horiike: Jpn. J. Appl. Phys. 44 (2005) 2879.
12. Y. Setsuhara, T. Shoji, A. Ebe, S. Baba, N. Yamamoto, K. Takahashi, K. Ono, and S. Miyake: Surf. Coat. Technol. 174 -175 (2003) 33.
13. Y. Setsuhara: J. Plasma Fusion Res. 81 (2005) 85.
14. K. Takenaka, Y. Setsuhara, K. Nishisaka, and A. Ebe: Jpn. J. Appl. Phys. 45 (2006) 8046.
15. O. Tsuda, M. Ishihara, Y. Koga, S. Fujiwara, Y. Setsuhara, and N. Sato: J. Phys. Chem. B 109 (2005) 4917.
16. H. Deguchi, H. Yoneda, K. Kato, K. Kubota, T. Hayashi, K. Ogata, A. Ebe, K. Takenaka, and Y. Setsuhara: Jpn. J. Appl. Phys. 45 (2006) 8042.
17. Y. Setsuhara, K. Takenaka, A. Ebe, and K. Nishisaka: Plasma Process. Polym. 4 (2007) S628.
18. E. Takahashi, Y. Nishigami, A. Tomyo, M. Fujiwara, H. Kaki, K. Kubota, T. Hayashi, K. Ogata, A. Ebe, and Y. Setsuhara: Jpn. J. Appl. Phys. 46 (2007) 1280.
19. K. Takenaka, Y. Setsuhara, K. Nishisaka, and A. Ebe: Jpn. J. Appl. Phys. 47 (2008) 6900.
20. A. A. Galuska, J. C. Uht, and N. Marquez: J. Vac. Sci. Technol. A 6 (1988) 110.
21. J. R. Waldrop and R. W. Grant: Appl. Phys. Lett. 56 (1990) 557.
22. S. H. Kim, S. W. Na, N.-E. Lee, Y. W. Nam, and Y.-H. Kim: Surf. Coat. Technol. 200 (2005) 2072.