Maskless etching of microstructures using a scanning microplasma etcher

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 235-238

  Ideno, Takuya ^a   Ichiki, Takanori ^b,c  

^a TOYO UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Maskless patterning; Microplasma; Silicon etching; Three dimensional etching

Indexed keywords

ATMOSPHERIC PRESSURE; COMPUTER AIDED DESIGN; ETCHING; NOZZLES; PLASMA ETCHING; SILICON WAFERS;

GAS FLOW RATES; MASKLESS PATTERN ETCHING; MICROFABRICATION; MICROPLASMA JET; PROTOTYPE; PSEUDO-THREE DIMENSIONAL ETCHING; SCAN SPEED;

MICROSTRUCTURE;

EID: 33645237142     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.271     Document Type: Conference Paper

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