Fabrication of high-compact nanowires using alternating photoresist ashing and spacer technology

Journal of Micromechanics and Microengineering

Volumn 20, Issue 8, 2010, Pages

  Mao, Haiyang ^a   Wu, Wengang ^a   Zhang, Yulong ^a   Zhai, Ge ^a   Xu, Jun ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

PARALLEL NANOWIRES; PATTERNING METHODS; PHOTORESIST ASHING; SPACER TECHNOLOGY; SUB-WAVELENGTH;

INNOVATION; PHOTORESISTS;

NANOWIRES;

EID: 77957839074     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/20/8/085029     Document Type: Article

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