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Volumn 20, Issue 44, 2009, Pages 445304-
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The fabrication of diversiform nanostructure forests based on residue nanomasks synthesized by oxygen plasma removal of photoresist.
a
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Author keywords
[No Author keywords available]
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Indexed keywords
COPPER;
EPOXIDE;
FLUORINE DERIVATIVE;
GOLD;
NANOMATERIAL;
OXYGEN;
POLYMER;
SILICON DIOXIDE;
SU 8 COMPOUND;
SU-8 COMPOUND;
WATER;
ARTICLE;
CHEMISTRY;
HYDROPHOBICITY;
INSTRUMENTATION;
METHODOLOGY;
NANOTECHNOLOGY;
SCANNING ELECTRON MICROSCOPY;
TIME;
ULTRASTRUCTURE;
COPPER;
EPOXY COMPOUNDS;
FLUORINE COMPOUNDS;
GOLD;
HYDROPHOBICITY;
MICROSCOPY, ELECTRON, SCANNING;
NANOSTRUCTURES;
NANOTECHNOLOGY;
OXYGEN;
POLYMERS;
SILICON DIOXIDE;
TIME FACTORS;
WATER;
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EID: 76549088620
PISSN: None
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/20/44/445304 Document Type: Article |
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Times cited : (44)
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References (0)
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