Formation of nanometer-scale gap electrodes based on a plasma ashing technique

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 744-747

  Lee, Younghun ^a   Roh, Yonghan ^a   Seob Kim, Kyoung ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

e beam lithography; Electrode; Nano device; PR ashing

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PLASMA APPLICATIONS;

NANODEVICES; NANOMETER-SIZED GAPS; PLASMA ASHING; PR ASHING;

ELECTRODES;

EID: 33748751973     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.189     Document Type: Article

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