Synchronous pulsed plasma for silicon etch applications

ECS Transactions

Volumn 27, Issue 1, 2010, Pages 717-723

  Darnon, M ^a   Petit Etienne, C ^a   Pargon, E ^a   Cunge, G ^a   Vallier, L ^a   Bodart, P ^a   Haas, M ^a   Banna, S ^b   Lill, T ^b   Joubert, O ^a  

^a CNRS   (France)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASS SPECTROMETRY; PASSIVATION; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

ANGLE RESOLVED X RAY PHOTOELECTRON SPECTROSCOPY; ETCH RATES; PASSIVATION LAYER; PATTERN PROFILE; PULSED PLASMA; RADICAL CONCENTRATION; SILICON RECESS; THIN SILICON OXIDE;

SILICON COMPOUNDS;

EID: 77957740192     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3360700     Document Type: Conference Paper

References (17)

1. L. Desvoivres, L. Vallier and O. Joubert, J. Vac. Sci. Technol. B 18 (1), 156-165 (2000).
2. M. E. Barone and D. B. Graves, J. Appl. Phys., 78 (11), (1995)
3. S. Banna et al, IEEE Transactions On Plasma Sc. 37 (9), 1730-1746 (2009)
4. K. Tokashiki et al, Jpn. J. Appl. Phys. 48, 08HD01 (2009)
5. A. Agarwal, P. J. Stout, S. Banna, S. Rauf, K. Tokashiki, J-Y. Lee, K. Collins, J. Appl. Phys. 106, 103305 (2009)
6. S. K. Kanakasabapathy, L. J. Overzet, V. Midha, and D. Economou, Appl. Phys. Lett. 78, 22 (2001).
7. S. A. Voronin, M. R. Alexander and J. W. Bradley, Meas. Sci. Technol. 16, 2446-2452 (2005).
8. L. J. Overzet, B. A. Smith, J. Kebler, and S. K. Kanakasabapathy, Jpn. J. Appl. Phys., Part 1 36, 2443 (1997).
9. T. Mieno and S. Samukawa, Plasma Sources Sci. Technol. 6, 398 (1997).
10. S. Samukawa and T. Meino, Plasma Sources Sci. Technol. 5, 132 (1996).
11. S. Samukawa and H. Ohtake, J. Vac. Sci. Technol. A 14, 3049 (1996).
12. J-H. Kim, C-J. Kang, T-H. ahn, J-T. Moon, Thin Solid Films 345, 124-129 (1999)
13. H. Ohtake, K. Noguchi, S. Samukawa, H. Lida, A. Sato and X-Y Qian, J. Vac. Sci. Technol. B. 18 (5), 2495-2499 (2000)
14. B. Pelissier, H. Kambara, E. Godot, E. Veran, V. Loup and O. Joubert, Microelectronic Engineering 85, 1882-1887 (2008)
15. O. Joubert, G. Cunge, B. Pelissier, L. Vallier, M. Kogelschatz, and E. Pargon, J. Vac. Sci. Technol. A, 22(3), 553-563, (2004)
16. L. Vallier, L. Desvoivres, M. Bonvalot, and O. Joubert, Appl. Phys. Lett. 7(8), 1069-1070 (1999)
17. S. A. Vitale and B. A. Smith, J. Vac. Sci. Technol. B 21(5), 2205-2211 (2003)