-
3
-
-
0027575850
-
Measurement of trace metallic contamination on silicon wafer surfaces in native and dielectric silicon oxides by vapor phase decomposition flow injection inductively coupled plasma mass spectrometry
-
J. Fucsko, S.S. Tan, and M.K. Balazs Measurement of trace metallic contamination on silicon wafer surfaces in native and dielectric silicon oxides by vapor phase decomposition flow injection inductively coupled plasma mass spectrometry J. Electrochem. Soc. 140 1993 1105 1109
-
(1993)
J. Electrochem. Soc.
, vol.140
, pp. 1105-1109
-
-
Fucsko, J.1
Tan, S.S.2
Balazs, M.K.3
-
4
-
-
0033343674
-
Application of vapor phase decomposition/total reflection X-ray fluorescence in the silicon semiconductor manufacturing environment
-
G. Buhrer Application of vapor phase decomposition/total reflection X-ray fluorescence in the silicon semiconductor manufacturing environment Spectrochim. Acta Part B 54 1999 1399 1407
-
(1999)
Spectrochim. Acta Part B
, vol.54
, pp. 1399-1407
-
-
Buhrer, G.1
-
5
-
-
0006754956
-
Sub-ppm monitoring of transition metal contamination on silicon wafer surfaces by VPD-TXRF
-
A. Huber, H. Rath, P. Eichinger, Th. Bauer, L. Kotz, and R. Staudigl Sub-ppm monitoring of transition metal contamination on silicon wafer surfaces by VPD-TXRF Electrochem. Soc. Proc. 88-20 1988 109 112
-
(1988)
Electrochem. Soc. Proc.
, vol.8820
, pp. 109-112
-
-
Huber, A.1
Rath, H.2
Eichinger, P.3
Bauer, T.4
Kotz, L.5
Staudigl, R.6
-
6
-
-
0001506138
-
Ultra-trace analysis of metallic contaminations on silicon wafer surfaces by vapour phase decomposition/total reflection X-ray fluorescence (VPD/TXRF)
-
C. Neumann, and P. Eichinger Ultra-trace analysis of metallic contaminations on silicon wafer surfaces by vapour phase decomposition/total reflection X-ray fluorescence (VPD/TXRF) Spectrochim. Acta Part B 46 1991 1369 1377
-
(1991)
Spectrochim. Acta Part B
, vol.46
, pp. 1369-1377
-
-
Neumann, C.1
Eichinger, P.2
-
7
-
-
37949011922
-
Fully automatic wafer surface contamination monitoring based on VPD-TXRF
-
A. Huber, and F. Freudenberg Fully automatic wafer surface contamination monitoring based on VPD-TXRF Electrochem. Soc. Proc. 99-16 1999 221 231
-
(1999)
Electrochem. Soc. Proc.
, vol.9916
, pp. 221-231
-
-
Huber, A.1
Freudenberg, F.2
-
8
-
-
0346643727
-
Development of vapor phase decomposition-total-reflection X-ray fluorescence spectrometer
-
M. Yamagami, A. Ikeshita, Y. Onizuka, S. Kojima, and T. Yamada Development of vapor phase decomposition-total-reflection X-ray fluorescence spectrometer Spectrochim. Acta Part B 58 2003 2079 2084
-
(2003)
Spectrochim. Acta Part B
, vol.58
, pp. 2079-2084
-
-
Yamagami, M.1
Ikeshita, A.2
Onizuka, Y.3
Kojima, S.4
Yamada, T.5
-
9
-
-
0035976307
-
A method of locating dried residue on a semiconductor wafer in vapor phase decomposition-total-reflection X-ray fluorescence spectrometry by monitoring scattered X-rays
-
Y. Mori, K. Uemura, M. Yamagami, and T. Yamada A method of locating dried residue on a semiconductor wafer in vapor phase decomposition-total-reflection X-ray fluorescence spectrometry by monitoring scattered X-rays Spectrochim. Acta Part B 56 2001 2293 2300
-
(2001)
Spectrochim. Acta Part B
, vol.56
, pp. 2293-2300
-
-
Mori, Y.1
Uemura, K.2
Yamagami, M.3
Yamada, T.4
-
10
-
-
10944239573
-
Saturation effects in TXRF on micro-droplet residue samples
-
D. Hellin, W. Fyen, J. Rip, T. Dalande, P. Mertens, S. De Gendt, and C. Vinckier Saturation effects in TXRF on micro-droplet residue samples J. Anal. At. Spectrom. 19 2004 1517 1523
-
(2004)
J. Anal. At. Spectrom.
, vol.19
, pp. 1517-1523
-
-
Hellin, D.1
Fyen, W.2
Rip, J.3
Dalande, T.4
Mertens, P.5
De Gendt, S.6
Vinckier, C.7
-
11
-
-
4644293541
-
Validation of vapor phase decomposition-droplet collection-total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers
-
D. Hellin, J. Rip, S. Arnauts, S. De Gendt, P. Mertens, and C. Vinckier Validation of vapor phase decomposition-droplet collection-total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers Spectrochim. Acta Part B 59 2004 1149 1157
-
(2004)
Spectrochim. Acta Part B
, vol.59
, pp. 1149-1157
-
-
Hellin, D.1
Rip, J.2
Arnauts, S.3
De Gendt, S.4
Mertens, P.5
Vinckier, C.6
-
13
-
-
0242637370
-
TXRF characterization of inhomogeneous solids: Influence of surface morphology
-
N. Alov, K. Oskolok, A. Wittershagen, and B. Kolbesen TXRF characterization of inhomogeneous solids: influence of surface morphology Electrochem. Soc. Proc. 2003-03 2003 129 135
-
(2003)
Electrochem. Soc. Proc.
, vol.200-303
, pp. 129-135
-
-
Alov, N.1
Oskolok, K.2
Wittershagen, A.3
Kolbesen, B.4
-
14
-
-
0030365867
-
Accurate calibration of TXRF using microdroplet samples
-
L. Fabry, S. Pahlke, and L. Kotz Accurate calibration of TXRF using microdroplet samples Fresenius J. Anal. Chem. 345 1996 266 270
-
(1996)
Fresenius J. Anal. Chem.
, vol.345
, pp. 266-270
-
-
Fabry, L.1
Pahlke, S.2
Kotz, L.3
-
15
-
-
0348221812
-
Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: Comparison of droplets with spin coated wafers
-
C. Streli, G. Pepponi, P. Wobrauschek, N. Zöger, P. Pianetta, K. Baur, S. Pahlke, L. Fabry, C. Mantler, B. Kanngießer, and W. Malzer Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers Spectrochim. Acta Part B 58 2003 2105 2112
-
(2003)
Spectrochim. Acta Part B
, vol.58
, pp. 2105-2112
-
-
Streli, C.1
Pepponi, G.2
Wobrauschek, P.3
Zöger, N.4
Pianetta, P.5
Baur, K.6
Pahlke, S.7
Fabry, L.8
Mantler, C.9
Kanngießer, B.10
Malzer, W.11
-
16
-
-
22544465830
-
Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers
-
D. Hellin, J. Rip, V. Geens, T. Delande, T. Conard, S. De Gendt, and C. Vinckier Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers J. Anal. Atom. Spectrom. 20 2005 652 658
-
(2005)
J. Anal. Atom. Spectrom.
, vol.20
, pp. 652-658
-
-
Hellin, D.1
Rip, J.2
Geens, V.3
Delande, T.4
Conard, T.5
De Gendt, S.6
Vinckier, C.7
-
17
-
-
77957223927
-
Influence of the sample morphology on total reflection X-ray fluorescence analysis
-
C. Horntrich, F. Meirer, C. Streli, P. Kregsamer, G. Pepponi, N. Zoeger, and P. Wobrauschek Influence of the sample morphology on total reflection X-ray fluorescence analysis Adv. X-Ray Anal. 52 2009 111 119
-
(2009)
Adv. X-Ray Anal.
, vol.52
, pp. 111-119
-
-
Horntrich, C.1
Meirer, F.2
Streli, C.3
Kregsamer, P.4
Pepponi, G.5
Zoeger, N.6
Wobrauschek, P.7
-
18
-
-
21344457362
-
Standard sample preparation for the analysis of several metals on silicon wafer
-
Y. Mori, and K. Shimanoe Standard sample preparation for the analysis of several metals on silicon wafer Anal. Sci. 12 1996 141 143
-
(1996)
Anal. Sci.
, vol.12
, pp. 141-143
-
-
Mori, Y.1
Shimanoe, K.2
-
19
-
-
4644231143
-
Semiconductor applications of nanoliter droplet methodology with total reflection X-ray fluorescence analysis
-
T. Miller, C. Sparks, G. Havrilla, and M. Beebe Semiconductor applications of nanoliter droplet methodology with total reflection X-ray fluorescence analysis Spectrochim. Acta Part B 59 2004 1117 1124
-
(2004)
Spectrochim. Acta Part B
, vol.59
, pp. 1117-1124
-
-
Miller, T.1
Sparks, C.2
Havrilla, G.3
Beebe, M.4
-
20
-
-
34948822033
-
Automated nanoliter solution deposition for total reflection X-ray fluorescence analysis of semiconductor samples
-
C.M. Sparks, C.H. Gondran, G.J. Havrilla, and E.P. Hastings Automated nanoliter solution deposition for total reflection X-ray fluorescence analysis of semiconductor samples Spectrochim. Acta Part B 61 2006 1091 1097
-
(2006)
Spectrochim. Acta Part B
, vol.61
, pp. 1091-1097
-
-
Sparks, C.M.1
Gondran, C.H.2
Havrilla, G.J.3
Hastings, E.P.4
-
21
-
-
34249776031
-
A new technique for the deposition of standard solutions in total reflection X-ray fluorescence spectrometry (TXRF) using pico-droplets generated by inkjet printers and its applicability for aerosol analysis with SR-TXRF
-
U.E.A. Fittschen, S. Hauschild, M.A. Amberger, G. Lammel, C. Streli, S. Förster, P. Wobrauschek, C. Jokubonis, G. Pepponi, G. Falkenberg, and J.A.C. Broekaert A new technique for the deposition of standard solutions in total reflection X-ray fluorescence spectrometry (TXRF) using pico-droplets generated by inkjet printers and its applicability for aerosol analysis with SR-TXRF Spectrochim. Acta Part B 61 2006 1098 1104
-
(2006)
Spectrochim. Acta Part B
, vol.61
, pp. 1098-1104
-
-
Fittschen, U.E.A.1
Hauschild, S.2
Amberger, M.A.3
Lammel, G.4
Streli, C.5
Förster, S.6
Wobrauschek, P.7
Jokubonis, C.8
Pepponi, G.9
Falkenberg, G.10
Broekaert, J.A.C.11
-
22
-
-
41449091127
-
Characteristics of picoliter droplet dried residues as standards for direct analysis techniques
-
U.E.A. Fittschen, N.H. Bings, S. Hauschild, S. Förster, A.F. Kiera, E. Karavani, A. Frömsdorf, J. Thiele, and G. Falkenberg Characteristics of picoliter droplet dried residues as standards for direct analysis techniques Anal. Chem. 80 2008 1967 1977
-
(2008)
Anal. Chem.
, vol.80
, pp. 1967-1977
-
-
Fittschen, U.E.A.1
Bings, N.H.2
Hauschild, S.3
Förster, S.4
Kiera, A.F.5
Karavani, E.6
Frömsdorf, A.7
Thiele, J.8
Falkenberg, G.9
-
23
-
-
75749088040
-
Picoliter droplet deposition using a prototype picoliter pipette: Control parameters and application in micro X-ray fluorescence
-
U.E.A. Fittschen, and G.J. Havrilla Picoliter droplet deposition using a prototype picoliter pipette: control parameters and application in micro X-ray fluorescence Anal. Chem. 82 2010 297 306
-
(2010)
Anal. Chem.
, vol.82
, pp. 297-306
-
-
Fittschen, U.E.A.1
Havrilla, G.J.2
-
24
-
-
35448992563
-
Reference-free total reflection X-ray fluorescence analysis of semiconductor surface with synchrotron radiation
-
B. Beckhoff, R. Fliegauf, M. Kolbe, M. Müller, J. Weser, and G. Ulm Reference-free total reflection X-ray fluorescence analysis of semiconductor surface with synchrotron radiation Anal. Chem. 79 2007 7873 7882
-
(2007)
Anal. Chem.
, vol.79
, pp. 7873-7882
-
-
Beckhoff, B.1
Fliegauf, R.2
Kolbe, M.3
Müller, M.4
Weser, J.5
Ulm, G.6
-
25
-
-
56449101097
-
Reference-free X-ray spectrometry based on metrology using synchrotron radiation
-
B. Beckhoff Reference-free X-ray spectrometry based on metrology using synchrotron radiation J. Anal. Atom. Spectrom. 6 2008 845 853
-
(2008)
J. Anal. Atom. Spectrom.
, vol.6
, pp. 845-853
-
-
Beckhoff, B.1
-
26
-
-
68049087856
-
The influence of X-ray coherenece length on TXRF and XSW and the characterization of nanoparticles observed under grazing incidence of X-rays
-
A. von Bohlen, M. Krämer, C. Sternemann, and M. Paulus The influence of X-ray coherenece length on TXRF and XSW and the characterization of nanoparticles observed under grazing incidence of X-rays J. Anal. Atom. Spectrom. 24 2009 792 800
-
(2009)
J. Anal. Atom. Spectrom.
, vol.24
, pp. 792-800
-
-
Von Bohlen, A.1
Krämer, M.2
Sternemann, C.3
Paulus, M.4
-
27
-
-
0024777385
-
Determination of the critical thickness and the sensitivity for thin film analysis by total reflection X-ray fluorescence spectrometry
-
R. Klockenkämper, and A. von Bohlen Determination of the critical thickness and the sensitivity for thin film analysis by total reflection X-ray fluorescence spectrometry Spectrochim. Acta Part B 44 1989 461 469
-
(1989)
Spectrochim. Acta Part B
, vol.44
, pp. 461-469
-
-
Klockenkämper, R.1
Von Bohlen, A.2
-
28
-
-
0030732736
-
Capillary flow as the cause of ring stains from dried liquid droplets
-
R.D. Deegan, O. Bakajin, T.F. Dupont, G. Huber, S.R. Nagel, and T.A. Witten Capillary flow as the cause of ring stains from dried liquid droplets Nature 389 1997 827 829
-
(1997)
Nature
, vol.389
, pp. 827-829
-
-
Deegan, R.D.1
Bakajin, O.2
Dupont, T.F.3
Huber, G.4
Nagel, S.R.5
Witten, T.A.6
-
29
-
-
0000342132
-
Influence of evaporation on contact angle
-
C. Bourgès-Monnier, and M.E.R. Shanahan Influence of evaporation on contact angle Langmuir 11 1995 2820 2829
-
(1995)
Langmuir
, vol.11
, pp. 2820-2829
-
-
Bourgès-Monnier, C.1
Shanahan, M.E.R.2
-
31
-
-
27144508119
-
Drop splashing on a dry smooth surface
-
L. Xu, W.W. Zhang, and S.R. Nagel Drop splashing on a dry smooth surface Phys. Rev. Lett. 94 2005 1 4 184505
-
(2005)
Phys. Rev. Lett.
, vol.94
, pp. 1-4
-
-
Xu, L.1
Zhang, W.W.2
Nagel, S.R.3
-
32
-
-
64549111333
-
Precursors to splashing of liquid droplets on a solid surface
-
S. Mandre, M. Mani, and M.P. Brenner Precursors to splashing of liquid droplets on a solid surface Phys. Rev. Lett. 102 2009 1 4 134502
-
(2009)
Phys. Rev. Lett.
, vol.102
, pp. 1-4
-
-
Mandre, S.1
Mani, M.2
Brenner, M.P.3
-
33
-
-
25144448309
-
X-ray standing waves and the critical sample thickness for total-reflection: X-ray fluorescence analysis
-
D.K.G. de Boer X-ray standing waves and the critical sample thickness for total-reflection: X-ray fluorescence analysis Spectrochim. Acta Part B 46 1991 1433 1436
-
(1991)
Spectrochim. Acta Part B
, vol.46
, pp. 1433-1436
-
-
De Boer, D.K.G.1
-
34
-
-
77957224760
-
Improvement of calibration processes in TXRF of wafer surface analysis: Investigation of saturation effects in TXRF by comparing picodroplets and microdroplets
-
C. Horntrich, F. Meirer, U.E.A. Fittschen, G. Pepponi, S. Sasamori, G.J. Havrilla, and C. Streli Improvement of calibration processes in TXRF of wafer surface analysis: Investigation of saturation effects in TXRF by comparing picodroplets and microdroplets The 13th Conference on Total Reflection X-ray Fluorescence analysis and Related Methods, June 15-19 2009, Göteborg, Sweden 2009
-
(2009)
The 13th Conference on Total Reflection X-ray Fluorescence Analysis and Related Methods, June 15-19 2009, Göteborg, Sweden
-
-
Horntrich, C.1
Meirer, F.2
Fittschen, U.E.A.3
Pepponi, G.4
Sasamori, S.5
Havrilla, G.J.6
Streli, C.7
|