Validation of vapor phase decomposition-droplet collection-total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 59, Issue 8, 2004, Pages 1149-1157

  Hellin, D ^a,b   Rip, J ^a   Arnauts, S ^a   De Gendt, S ^a,b   Mertens, P W ^a   Vinckier, C ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Accuracy; Contamination analysis; Recovery rate; Validation; VPD DC TXRF

Indexed keywords

CONTAMINATION; DECOMPOSITION; FLUORESCENCE; LIGHT SCATTERING; MASS SPECTROMETRY; RECOVERY; SILICON WAFERS;

CONTAMINATION ANALYSIS; RECOVER RATES; TOTAL REFLECTION-X-RAY FLUORESCENCE SPECTROMETRY (TXRF); VAPOR PHASE DECOMPOSITION-DROPLET COLLECTION (VPD-DC);

X RAY SPECTROSCOPY;

EID: 4644293541     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2004.03.011     Document Type: Conference Paper

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