Semiconductor applications of nanoliter droplet methodology with total reflection X-ray fluorescence analysis

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 59, Issue 8, 2004, Pages 1117-1124

  Miller, Thomasin C ^a   Sparks, Christopher M ^b   Havrilla, George J ^a   Beebe, Meredith R ^b  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b Proc Characterization Anal Lab   (United States)

Author keywords

Micro X ray fluorescence; Nanoliter dried spot deposition; Silicon wafer analysis; Total reflection X ray fluorescence; Vapor phase decomposition

Indexed keywords

ELECTRIC POTENTIAL; ELECTROPHORESIS; FLUORESCENCE; SEMICONDUCTOR MATERIALS; SILICON WAFERS;

MICRO X-RAY FLUORESCENCE; NANOLITER DRIED SPOT DEPOSITION; SILICON WAFER ANALYSIS; TOTAL REFLECTION X-RAY FLUORESCENCE; VAPOR PHASE DECOMPOSITION;

X RAYS;

EID: 4644231143     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sab.2003.11.010     Document Type: Conference Paper

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