Accurate calibration of TXRF using microdroplet samples

Fresenius' Journal of Analytical Chemistry

Volumn 354, Issue 3, 1996, Pages 266-270

  Fabry, Laszlo ^a   Pahlke, Siegfried ^a   Kotz, Ludwig ^a  

^a WACKER CHEMIE AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; OXIDES; SILICON; SILICON WAFERS; TRACE ANALYSIS;

X RAY FLUORESCENCE SPECTROMETRY;

CHEMICAL ANALYSIS;

EID: 0030365867     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s0021663540266     Document Type: Article

References (30)

1. Hockett RS (1994) Adv X-Ray Anal 37:5652
2. Kawai K (1994) 22nd Internat Symp on ULSI Ultra Clean Technol, Tokyo Aug 1994
3. Hourai M, Naridomi T, Oka T, Murakami K, Sumita S, Fujino N (1988) Jpn J Appl Phys 27:L2361
4. Mori Y, Uemura K, Shimanoe K, Sakon T (1994) In: Huff HR, Bergholz W, Sumino K (eds) Semiconductor Si, PV 94-10. The Electrochem Soc, Pennineton, NJ, p 248; Jpn Patent Appl 5-39055
5. Jacobson DC, Poate JM, Higashi GS, Bone T, Eaglsham DJ, Hockett R (1993) Nucl Inst Meth Phys Res B74:281
6. Fabry L, Pahlke S, Kotz L, Adachi Y, Furukawa S (1995) Adv X-Ray Chem Anal, Jpn 26s:19
7. Berneike W, Knoth J, Schwenke H, Weisbrod U (1989) Fresenius Z Anal Chem 333:524
8. ASTM F 1526 - 94 Standard test method for TXRF § 10.1 (a) (1994) Amer Soc for Testing and Mater Philadelphia, PA
9. Diebold AC, Maillot P, Gordon M, Baylis J, Chacon J, Witowski R, Arlinehaus HF, Knapp JA, Doyle BL (1992) J Vac Sci Technol A 10:2945
10. Briska M (1977) Technical Disclosure Bulletin, p 227
11. Shimazaki A, Hiratsuka H, Matsushita Y, Yoshii S (1984) 16th Conference on Solid State Devices & Mater, Kobe Business Center for Acad Soc Jpn, Tokyo, p 281
12. Shiraiwa T, Fujino N, Sumita S, Tanizoe Y. In: Gupta DC (ed) Technol Metrol ASTM STD 990. ASTM, Philadelphia, PA, p 314
13. DIN EN ISO 9001 Quality systems § 4.11.2(b) (1994) Eur Cmte for Standardization, Brussels
14. Fabry L, Pahlke S, Kotz L, Schemmel E, Berneike W (1993) In: Kolbesen BO, Stallhofer P, Claeys C, Tardif F (eds) Crystalline defects, PV 93-15. The Electrochem Soc, Pennington, NJ, p 232
15. Schamber FH (1977) In: Dunbay TG (ed) In: X-ray fluoresc anal. Ann Arbor Science, Ann Arbor, MI, p 241
16. Balazs M (1993) Pure Water Spec, Balazs Lab Sunnyvale, CA
17. Eichinger P, Rath HJ, Schwenke H (1989) Semiconductor Fabrication. ASTM STP 900 p 305. Amer Soc for Testing and Mater, Philadelphia, PA
18. Klockenkämper R, Knoth J, Prange A, Schwenke H (1992) Anal Chem 64:1115A
19. Schwenke H, Knoth J, Weisbrod U (1991) X-Ray Spectrometry 20:277
20. Reus U, Prange A (1993) Spectroscopy Eur 5:26
21. Kregsamer P (1991) Spectrochim Acta 46B:1333
22. Berneike W (1993) Spectrochim Acta 48B:169
23. Klockenkämper R, von Bohlen A (1989) Spectrochim Acta 44B:461
24. Kondo H, Ryuta J, Morita E, Yoshimi T, Shimanaki Y (1992) Jpn J Appl Phys 31:L11
25. Yakushiji K, Ohkawa S, Yoshinaga A, Harada J (1994) Jpn J Appl Phys 33:1130
26. Booksh KS, Kowalski BR (1994) Anal Chem 66:782
27. Tölg G (1988) Fresenius Z Anal Chem 329:735
28. Hockett RS (1990) In: Sumino K (ed) Defect control. Elsevier, Amsterdam, pp 1547-1552
29. Mullins E (1994) Analyst 119:369
30. Huber A, Rath HJ, Eichinger P, Bauer T, Kotz L, Staudigl R (1988) In: Schaffner TJ, Schröder DI (eds) Diagn Tech for Semicond, PV 88-20. The Electrochem Soc, Pennington, NJ, p 109