EUV resist imaging below 50 nm using coherent spatial filtering techniques

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 454-459

  Shumway, Michael D ^a,b   Snow, Eric L ^a,b   Goldberg, Kenneth A ^b   Naulleau, Patrick ^b   Cao, Heidi ^c   Chandhok, Manish ^c   Liddle, Alexander ^b   Anderson, Erik ^b   Bokor, Jeffrey ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Aerial image contrast; EUV; Extreme ultraviolet lithography; Schwarzschild objective; Spatial frequency doubling

Indexed keywords

AERIAL IMAGE CONTRAST; EXTREME ULTRAVIOLET LITHOGRAPHY; SCHWARZSCHILD OBJECTIVE; SPATIAL FREQUENCY DOUBLING;

ELECTRON BEAMS; FREQUENCY DOUBLERS; OPTICAL FILTERS; OPTICAL RESOLVING POWER; PHOTORESISTS; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 3843092676     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535666     Document Type: Conference Paper

References (4)

1. W. Yueh, H. Cao, M. Chandhok, S. Lee, M. Shumway, J. Bokor, "Patterning Capabilities of EUV Resists," in Advances in Resist Technology and Processing XXI. Proc. SPIE 5376, (2004).
2. M. D. Shumway, P. P. Naulleau, K. A. Goldberg, E. L. Snow, J. Bokor, "Resist evaluation at 50 nm in the EUV using interferometric spatial-frequency-doubled imaging," in Emerging Lithographic Technologies VII. R. L. Engelstad, Ed., Proc. SPIE 5037, 910-16 (2003).
3. M. D. Shumway, S. H. Lee, C. H. Cho, P. Naulleau, K. A. Goldberg, J. Bokor, "Extremely fine-pitch printing with a 10×Schwarzschild optic at extreme ultraviolet wavelengths," in Emerging Lithographic Technologies V. E. A. Dobisz, Ed., Proc. SPIE 4343, 357-62 (2001).
4. J. A. Hoffnagle, W. D. Hinsberg, M. I. Sanchez, F. A. Houle, "Method of measuring the spatial resolution of a photoresist," Optics Letters, 27, (20), 1776-8, (2002).