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Journal of Photopolymer Science and Technology

Volumn 23, Issue 5, 2010, Pages 673-680

EUV interference lithography for 22 nm node and below

(7) Fukushima, Yasuyuki a Yamaguchi, Yuya a Kimura, Teruhiko a Iguchi, Takafumi a Harada, Tetsuo a Watanabe, Takeo a Kinoshita, Hiroo a

a UNIVERSITY OF HYOGO (Japan)

Author keywords

EUV; Fresnel diffraction; Interference; Resist; Transmission grating

Indexed keywords

EID: 77957109331 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.23.673 Document Type: Article

Times cited : (12)

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