Pattern replication in EUV interference lithography

Journal of Photopolymer Science and Technology

Volumn 21, Issue 3, 2008, Pages 435-438

  Suzuki, Shota ^a   Fukushima, Yasuyuki ^a   Ohnishi, Ryuji ^a   Watanabe, Takeo ^a   Kinoshita, Hiroo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Chemically amplified resist; EUV resist; Interference lithography

Indexed keywords

EID: 50149100893     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.435     Document Type: Article

References (11)

1. H. Kinoshita, K. Kurihara, Y. Ishii and Y. Torii: J. Vac. Sci. Technol. B 7 (1989) 1648.
2. Three top issues in EUVL, EUVL international symposium 2007.
3. Roel Gronheid, Alan M. Myers, Frieda Van Roey, H.H.Solak, Yasin Ekinci, Tom Vandeweyer, Anne-Marie Goethals: presented at 2RE05, EUVL International Symposium 2006, Bercelona, Spain.
4. R. Tatchyn, E. Kallne, A. Toor, T. Cremer and P. Csonka: Rev. Sci. Instrum. 60 (1989) 1579.
5. H. H. Solak, D. He, W. Li, F, Cerrina, B. H. Sohn, X. M. Yang and P. F. Nealey: Appl. Phys. Lett. 75 (1999) 2328.
6. M. Wei, D. T. Attwood and T. K. Gustafson: J. Vac. Sci. Technol. B12 (1994) 3648.
7. H. H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S. O. Kim and P. F. Nealey: Microelectron. Eng. 56 (2003) 67.
8. Pedrotti, Frank L.: Introduction to optics. (Prentice-Hall, New Jersey, 1987) p.317.1.
9. T.Omote, "Polyimides", M.Ghosh, and K.L.Miital, Eds., Dekker, New York, 1996, p.121.
10. H.Nii, H.Kinoshita, T.Watanabe, Y.Matsuo and Y.Sugie: SPIE Vol. 4409 (2001)
11. H. H. Solak: Appl. Phys. 39(2006)R171-R188