Desorption kinetics of GeO from GeO2 /Ge structure

Journal of Applied Physics

Volumn 108, Issue 5, 2010, Pages

  Wang, Sheng Kai ^a   Kita, Koji ^a,b   Lee, Choong Hyun ^a   Tabata, Toshiyuki ^a,b   Nishimura, Tomonori ^a,b   Nagashio, Kosuke ^a,b   Toriumi, Akira ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; DESORPTION KINETICS; DESORPTION MECHANISM; DESORPTION MODELS; DIFFERENT MECHANISMS; DIFFUSION PROCESS; GE SUBSTRATES; INTERFACE REACTIONS; ISOTOPE TRACING; KINETIC CALCULATIONS; LOW OXYGEN PARTIAL PRESSURE; NONUNIFORM; OXYGEN-18; SILICON TRANSISTORS; UHV ANNEALING;

ACTIVATION ANALYSIS; ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; ISOTOPES; OXIDATION; OXYGEN; SURFACE CHEMISTRY; THERMAL DESORPTION; THERMAL DESORPTION SPECTROSCOPY;

GERMANIUM;

EID: 77956858992     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3475990     Document Type: Article

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