Density measurement of W thin films coating by combination of ion beam analysis and scanning electron microscopy

EPJ Applied Physics

Volumn 31, Issue 1, 2005, Pages 17-22

  Wang, C ^a,b   Brault, P ^a   Sauvage, T ^c  

^a UNIVERSITÉ D'ORLÉANS   (France)

^b BEIHANG UNIVERSITY   (China)

^c Centre d'Etudes et de Recherches par Irradiation   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; CRYSTAL ORIENTATION; DENSITY MEASUREMENT (SPECIFIC GRAVITY); ION BEAMS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; TEXTURES; THICKNESS MEASUREMENT;

CRYSTALLINE ORIENTATION AND TEXTURE; DEPOSITION BY SPUTTERING; STRUCTURE AND MORPHOLOGY; THICKNESS;

THIN FILMS;

EID: 22144472275     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2005028     Document Type: Article

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