Nanostructured TiO x film on Si substrate: Room temperature formation of TiSi x nanoclusters

Journal of Nanoparticle Research

Volumn 12, Issue 7, 2010, Pages 2645-2653

  Chiodi, Mirco ^b   Cavaliere, Emanuele ^a   Kholmanov, Iskandar ^a,c   De Simone, Monica ^b   Sakho, Oumar ^b,d   Cepek, Cinzia ^b   Gavioli, Luca ^a,b  

^a UNIVERSITÀ CATTOLICA DEL SACRO CUORE   (Italy)

^b LABORATORIO TASC   (Italy)

^c INFM   (Italy)

^d Dpartement de Chimie   (Senegal)

Author keywords

Cluster; Cluster assembled TiO x; Nanostructure; Silicide; Synthesis; Thin film; TiSi x

Indexed keywords

CLUSTER; CLUSTER BEAM SOURCES; CLUSTER SIZES; FILM ROUGHNESS; LIMIT SETS; NANO-DEVICES; NANO-STRUCTURED; NANOSTRUCTURED TIO; ORDER OF MAGNITUDE; POROUS FILM; ROOM TEMPERATURE; SI DIFFUSION; SI SUBSTRATES; SILICON SUBSTRATES; SPECTROSCOPIC STUDIES; SYNTHESIS; SYNTHESIS METHOD; TEMPERATURE RANGE; THERMAL TREATMENT; TIO; TISI X; TITANIUM SILICIDE;

DESORPTION; NANOSTRUCTURES; OXYGEN; SILICIDES; SILICON; SPECTROSCOPIC ANALYSIS; SUBSTRATES; THIN FILMS; TITANIUM;

TITANIUM COMPOUNDS;

SILICON; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; DIFFUSION; FILM; INTEGRATION; MORPHOLOGY; NANODEVICE; PRIORITY JOURNAL; ROOM TEMPERATURE; STOICHIOMETRY; SYNTHESIS;

EID: 77956269454     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-009-9843-3     Document Type: Article

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