Visible and UV pulsed laser processing of the Ti/Si(0 0 1) interface studied by XPS microscopy with synchrotron radiation

Surface Science

Volumn 482-485, Issue PART 1, 2001, Pages 141-146

  Larciprete, R ^a,b   Danailov, M ^a   Barinov, A ^a   Casalis, L ^a   Gregoratti, L ^a   Goldoni, A ^a   Kiskinova, M ^a  

^a SINCROTRONE TRIESTE   (Italy)

^b ENEA   (Italy)

Author keywords

Laser methods; Silicides

Indexed keywords

PULSED LASER DEPOSITION; SILICON WAFERS; SYNCHROTRON RADIATION; TITANIUM; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM SILICIDES;

SURFACE CHEMISTRY;

EID: 4243238304     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)00759-2     Document Type: Conference Paper

References (18)