The formation of TiSi2 by RTA processing

Thin Solid Films

Volumn 298, Issue 1-2, 1997, Pages 62-65

  Wan, Wen Kai ^a   Wu, Shinn Tyan ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Annealing; Silicides; SIMS; Titanium

Indexed keywords

ANNEALING; CARBON; ELECTRIC CONDUCTIVITY OF SOLIDS; IMPURITIES; MAGNETRON SPUTTERING; OXYGEN; SECONDARY ION MASS SPECTROMETRY; SILICON WAFERS; SPUTTER DEPOSITION; TITANIUM COMPOUNDS;

TITANIUM SILICIDES;

METALLIC FILMS;

EID: 0031121361     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09161-4     Document Type: Article

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