Surface morphology of annealed titanium /silicon bilayer in the presence of oxygen

Applied Physics Letters

Volumn 87, Issue 10, 2005, Pages

  Ilango, S ^a   Raghavan, G ^a   Kamruddin, M ^a   Bera, Santanu ^a   Tyagi, A K ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

RESISTANCE IMAGING; TOPOGRAPHY; VACUUM-ANNEALED TITANIUM FILMS;

ATOMIC FORCE MICROSCOPY; COALESCENCE; MASS SPECTROMETRY; METALLIC FILMS; MORPHOLOGY; OXYGEN; PHOTOELECTRON SPECTROSCOPY; SILICON; SURFACE ROUGHNESS; TITANIUM; TITANIUM OXIDES;

ANNEALING;

EID: 24644465016     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2042537     Document Type: Article

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