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Volumn 518, Issue 23, 2010, Pages 6933-6937
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Making modified fluoropolymer molds for ultraviolet nanoimprint lithography
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Author keywords
Additive; Cast molding process; Fluoropolymer molds; Sub 30 nm structures
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Indexed keywords
CAST-MOLDING PROCESS;
COMMERCIAL POLYMERS;
ELECTRONIC BEAM LITHOGRAPHY;
FINE FEATURE;
FLUOROPOLYMER;
HIGH ASPECT RATIO;
LOW SURFACE ENERGY;
NANO-IMPRINT;
RESIST PATTERN;
SOLVENT RESISTANT;
SUB-30 NM STRUCTURES;
SURFACE ENERGIES;
ULTRAVIOLET-NANOIMPRINT LITHOGRAPHY;
ASPECT RATIO;
INTERFACIAL ENERGY;
MOLDING;
NANOIMPRINT LITHOGRAPHY;
PHOTORESISTS;
SURFACE CHEMISTRY;
MOLDS;
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EID: 77956230928
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.06.038 Document Type: Article |
Times cited : (8)
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References (22)
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