SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 5, 2009, Pages 2091-2096

Effects of exposure time on defects and demolding force in soft ultraviolet nanoimprint lithography

(5) Ye, Xiangdong a Ding, Yucheng a Duan, Yugang a Liu, Hongzhong a Lu, Bingheng a

a XI'AN JIAOTONG UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT PROCESS; CONVENTIONAL PHOTOLITHOGRAPHY; CURING DEGREE; CURING PROCESS; CURING SHRINKAGE; CURING TIME; DEMOLDING; DIFFRACTION EFFECTS; EXPOSURE-TIME; MECHANICAL MODEL; NANOIMPRINT PROCESS; PARTICLE CONTAMINATION; PATTERN TRANSFERS; PROCESS PARAMETERS; SHAPED PATTERN; SOFT MOLD; TWO-COMPONENT; ULTRA-VIOLET; ULTRAVIOLET-NANOIMPRINT LITHOGRAPHY; UV IMPRINT PROCESS;

CEMENTS; DEFECTS; MOLDS; NANOIMPRINT LITHOGRAPHY; PHOTORESISTS; SILICONES;

CURING;

EID: 70349675884 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.3186611 Document Type: Article

Times cited : (18)

References (10)

1
- 0035519809
- Step and flash imprint lithography: Defect analysis
- DOI 10.1116/1.1420203, 45th International COnference on Electron, Ion, and Photon Beam Technology and Nanofabrication
- T. Bailey, B. Smith, B. J. Choi, H. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, J. Vac. Sci. Technol. B 1071-1023 19, 2806 (2001). 10.1116/1.1420203 (Pubitemid 34089832)
- (2001) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.19 , Issue.6 , pp. 2806-2810
- Bailey, T.¹ Smith, B.² Choi, B.J.³ Colburn, M.⁴ Meissl, M.⁵ Sreenivasan, S.V.⁶ Ekerdt, J.G.⁷ Willson, C.G.⁸

2
- 29044440010
- 1071-1023,. 10.1116/1.2102971
- S. Johnson, J. Vac. Sci. Technol. B 1071-1023 23, 2553 (2005). 10.1116/1.2102971
- (2005) J. Vac. Sci. Technol. B , vol.23 , pp. 2553
- Johnson, S.¹

3
- 14844322916
- Simulation and investigation of factors affecting high aspect ratio UV embossing
- DOI 10.1021/la035124e
- M. B. Chan-Park, Y. C. Lam, P. Laulia, and S. C. Joshi, Langmuir 0743-7463 21, 2000 (2005). 10.1021/la035124e (Pubitemid 40338633)
- (2005) Langmuir , vol.21 , Issue.5 , pp. 2000-2007
- Chan-Park, M.B.¹ Lam, Y.C.² Laulia, P.³ Joshi, S.C.⁴

4
- 33847715985
- Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting
- DOI 10.1021/nl061217f
- E. C. Hagberg, M. Malkoch, Y. Ling, C. J. Hawker, and K. R. Carter, Nano Lett. 1530-6984 7, 233 (2007). 10.1021/nl061217f (Pubitemid 46383576)
- (2007) Nano Letters , vol.7 , Issue.2 , pp. 233-237
- Hagberg, E.C.¹ Malkoch, M.² Ling, Y.³ Hawker, C.J.⁴ Carter, K.R.⁵

5
- 0035519764
- Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers
- DOI 10.1116/1.1420199, 45th International COnference on Electron, Ion, and Photon Beam Technology and Nanofabrication
- Matthew Colburn, Itai Suez, Byung Jing Choi, Mario Meissl, Todd Bailey, S. V. Sreenivasan, John G. Ekerdt, and C. G. Willson, J. Vac. Sci. Technol. B 1071-1023 19, 2685 (2001). 10.1116/1.1420199 (Pubitemid 34089806)
- (2001) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.19 , Issue.6 , pp. 2685-2689
- Colburn, M.¹ Suez, I.² Choi, B.J.³ Meissl, M.⁴ Bailey, T.⁵ Sreenivasan, S.V.⁶ Ekerdt, J.G.⁷ Willson, C.G.⁸

6
- 3142646098
- 0277-786X,. 10.1117/12.536216
- Ryan L. Burns, Proc. SPIE 0277-786X 5374, 348 (2004). 10.1117/12.536216
- (2004) Proc. SPIE , vol.5374 , pp. 348
- Burns, R.L.¹

7
- 26944465388
- Study of the kinetics of step and flash imprint lithography photopolymerization
- DOI 10.1002/aic.10477
- M. D. Dickey, R. L. Burns, E. K. Kim, S. C. Johnson, N. A. Stacey, and C. G. Willson, AIChE J. 0001-1541 51, 2547 (2005). 10.1002/aic.10477 (Pubitemid 41482244)
- (2005) AIChE Journal , vol.51 , Issue.9 , pp. 2547-2555
- Dickey, M.D.¹ Burns, R.L.² Kim, E.K.³ Johnson, S.C.⁴ Stacey, N.A.⁵ Willson, C.G.⁶

8
- 32444439313
- Kinetic parameters for Step and Flash Imprint Lithography photopolymerization
- DOI 10.1002/aic.10666
- Michael D. Dickey and C. Grant Willson, AIChE J. 0001-1541 52, 777 (2006). 10.1002/aic.10666 (Pubitemid 43226823)
- (2006) AIChE Journal , vol.52 , Issue.2 , pp. 777-784
- Dickey, M.D.¹ Willson, C.G.²

9
- 59049108196
- 0167-9317,. 10.1016/j.mee.2008.10.011
- X. Ye, H. Liu, Y. Ding, H. Li, and B. Lu, Microelectron. Eng. 0167-9317 86, 310 (2009). 10.1016/j.mee.2008.10.011
- (2009) Microelectron. Eng. , vol.86 , pp. 310
- Ye, X.¹ Liu, H.² Ding, Y.³ Li, H.⁴ Lu, B.⁵

10
- 32044435133
- Thermal analysis for step and flash imprint lithography during UV curing process
- DOI 10.1016/j.mee.2005.08.007, PII S0167931705004326
- E. K. Kim and C. G. Willson, Microelectron. Eng. 0167-9317 83, 213 (2006). 10.1016/j.mee.2005.08.007 (Pubitemid 43199281)
- (2006) Microelectronic Engineering , vol.83 , Issue.2 , pp. 213-217
- Kim, E.K.¹ Willson, C.G.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.