Solvent-Resistant Photocurable "Liquid Teflon" for Microfluidic Device Fabrication

Journal of the American Chemical Society

Volumn 126, Issue 8, 2004, Pages 2322-2323

  Rolland, Jason P ^a   Van Dam, R Michael ^b   Schorzman, Derek A ^a   Quake, Stephen R ^b   DeSimone, Joseph M ^a,c  

^a University of North Carolina at Chapel Hill   (United States)

^b California Institute of Technology   (United States)

^c North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

POLITEF; SOLVENT;

ARTICLE; CHEMICAL ANALYSIS; CHEMICAL REACTION; DEVICE; LIQUID; PHOTOCHEMISTRY; SYNTHESIS;

EID: 1542375006     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja031657y     Document Type: Article

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