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Volumn 506, Issue 1, 2010, Pages 388-394
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Analysis of the electrical characteristics of Zn/ZnSe/n-Si/Au-Sb structure fabricated using SILAR method as a function of temperature
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Author keywords
Barrier inhomogeneity; Gaussian distribution; Sandwich structure; SILAR method; ZnSe
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Indexed keywords
BARRIER HEIGHTS;
BARRIER INHOMOGENEITIES;
CAPACITANCE-VOLTAGE CHARACTERISTICS;
CURRENT VOLTAGE;
ELECTRICAL CHARACTERISTIC;
GAUSSIANS;
I - V CURVE;
IDEALITY FACTORS;
IV CHARACTERISTICS;
POLYCRYSTALLINE STRUCTURE;
REVERSE BIAS;
RICHARDSON CONSTANT;
RICHARDSON PLOT;
SCANNING ELECTRON MICROSCOPES;
SEM STUDY;
SI SUBSTRATES;
SILAR METHOD;
STRUCTURAL AND MORPHOLOGICAL PROPERTIES;
SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS;
TEMPERATURE DEPENDENCE;
TEMPERATURE DEPENDENT;
XRD;
ZERO-BIAS;
ZNSE;
ZNSE THIN FILMS;
ADSORPTION;
BIAS VOLTAGE;
CARRIER CONCENTRATION;
DEPOSITION;
GAUSSIAN DISTRIBUTION;
SANDWICH STRUCTURES;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
CURRENT VOLTAGE CHARACTERISTICS;
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EID: 77956095176
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2010.07.013 Document Type: Article |
Times cited : (33)
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References (43)
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