UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6432-6436

  Lee, Byoung H ^a   Cho, Sangho ^a   Hwang, Jae K ^a   Kim, Su H ^a   Sung, Myung M ^a  

^a Hanyang University   (South Korea)

Author keywords

Atomic layer deposition; PET; Self limiting reaction; UV ALD; ZrO2

Indexed keywords

ADHESIVE STRENGTH; ELECTRICAL PROPERTY; HIGH QUALITY; PET; POLYMER SUBSTRATE; ROOM TEMPERATURE; SELF-LIMITING REACTION; SHARP INTERFACE; UV LIGHT; UV-ALD; ZRO2;

ATOMIC LAYER DEPOSITION; ATOMS; ELECTRIC PROPERTIES; ETHYLENE; POLYETHYLENE TEREPHTHALATES; POLYMERS; SURFACE REACTIONS; THIN FILMS; VAPOR DEPOSITION; ZIRCONIUM; ZIRCONIUM ALLOYS;

POLYMER FILMS;

EID: 77956057890     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.059     Document Type: Conference Paper

References (26)

1. A.G. Erlat, R.J. Spontak, R.P. Clarke, T.C. Robinson, P.D. Haaland, Y. Tropsha, N.G. Harvey, and E.A. Vogler J. Phys. Chem. B 103 1999 6047
2. A. Yializis, M.G. Mikhael, and R.E. Ellwanger 43rd Annual Technical Conference Proceedings 2000 Society of Vacuum Coaters Albuquerque, NM p. 404
3. T. Suntola Thin Solid Films 216 1992 84
4. T. Suntola Mater. Sci. Rep. 4 1989 261
5. M. Leskelä, and M. Ritala Thin Solid Films 409 2002 138
6. M.A. Cameron, I.P. Gartland, J.A. Smith, S.F. Diaz, and S.M. George Langmuir 16 2000 7435
7. J.P. Lee, and M.M. Sung J. Am. Chem. Soc. 126 2004 28
8. H. Shin, D.-K. Jeong, J. Lee, M.M. Sung, and J. Kim Adv. Mater. 16 2004 1197
9. E.K. Seo, J.W. Lee, H.M. Sung-Suh, and M.M. Sung Chem. Mater. 16 2004 1878
10. M.H. Park, Y.J. Jang, H.M. Sung-Suh, and M.M. Sung Langmuir 20 2004 2257
11. J.W. Klaus, and S.M. George Surf. Sci. 447 2000 81
12. J.W. Klaus, O. Sneh, and S.M. George Science 278 1997 1934
13. Y. Luo, D. Slater, M. Han, J. Moryl, and R.M. Osgood Appl. Phys. Lett. 71 1997 3799
14. M.D. Groner, F.H. Fabreguette, J.W. Elam, and S.M. George Chem. Mater. 16 2004 639
15. M. Ritala, and M. Leskelä Appl. Surf. Sci. 75 1994 333
16. R. Taylor, J.R. Brandon, and P. Morrell Surf. Coat. Technol. 50 1992 141
17. G. Johner, and K.K. Schweitzer Thin Solid Films 119 1984 301
18. M. Putkonen, J. Niinistö, K. Kukli, T. Sajavaara, M. Karppinen, H. Yamauchi, and L. Niinistö Chem. Vap. Deposition 9 2000 207
19. K. Jukli, M. Ritala, and M. Leskelä Chem. Vap. Deposition 6 2000 297
20. J.P. Chang, and Y.-S. Lin J. Appl. Phys. 90 2001 2964
21. M. Copel, M. Gribelyuk, and E. Gusev Appl. Phys. Lett. 76 2000 436
22. M. Cassir, F. Goubin, C. Bernay, P. Vernoux, and D. Lincot Appl. Surf. Sci. 193 2002 120
23. J. Aarik, A. Aidla, H. Mändar, T. Uustare, and V. Sammelselg Thin Solid Films 408 2002 97
24. T. Ohishi, S. Maekawa, and A. Katoh J. Non-Cryst. Solids 147 1992 493
25. S. Okusaki, and T. Ohishi J. Non-Cryst. Solids 319 2003 311
26. A. Ishizaka, and Y.J. Shiraki J. Electrochem. Soc. 133 1986 666