SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4675-4679

Depositions of SrRuO3 thin films on oxide substrates with liquid-delivery spin MOCVD

(6) Schwarzkopf, J a Dirsyte, R a Devi, A b Schmidbauer, M a Wagner, G a Fornari, R a

a LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH (Germany)

b RUHR UNIVERSITY BOCHUM (Germany)

Author keywords

Liquid delivery MOCVD; Perovskite substrates; SrRuO3; Structural properties; Thin films

Indexed keywords

CARBON INCORPORATION; COMPRESSIVE STRAIN; DEPOSITION CONDITIONS; ELECTRICAL RESISTIVITY; GROWTH PROCESS; HIGH GROWTH RATE; LATTICE STRAIN; LIQUID DELIVERY MOCVD; MOCVD; OPTIMIZED CONDITIONS; OXIDE SUBSTRATES; PEROVSKITE SUBSTRATES; SRRUO3; SRTIO; STEP-FLOW GROWTH; STRUCTURAL ORDERING; SYSTEMATIC VARIATION;

ELECTRIC CONDUCTIVITY; EPITAXIAL GROWTH; LIQUIDS; PEROVSKITE; STRONTIUM COMPOUNDS; TENSILE STRAIN; THIN FILMS; VAPOR DEPOSITION;

OXIDE FILMS;

EID: 77955621523 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.12.057 Document Type: Conference Paper

Times cited : (8)

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