Thermal stability of epitaxial SrRuO 3 films as a function of oxygen pressure

Applied Physics Letters

Volumn 84, Issue 20, 2004, Pages 4107-4109

  Lee, Ho Nyung ^a   Christen, Hans M ^a   Chisholm, Matthew F ^a   Rouleau, Christopher M ^a   Lowndes, Douglas H ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL FILMS; OXYGEN PRESSURE; ROOM TEMPERATURE; Z-CONTRAST SCANNING TRANSMISSION ELECTRON MICROSCOPY (Z-STEM);

ACTIVATION ENERGY; ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL LATTICES; ELECTRIC CONDUCTIVITY; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; PRESSURE EFFECTS; PULSED LASER DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SUBSTRATES; THERMODYNAMIC STABILITY; THIN FILMS;

STRONTIUM COMPOUNDS;

EID: 2942642473     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1753650     Document Type: Article

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