Metalorganic chemical vapor deposition of atomically flat SrRuO3 films on stepped SrTiO3 substrates

Applied Physics Letters

Volumn 87, Issue 5, 2005, Pages

  Sumi, Akihiro ^a   Takahashi, Kenji ^a   Yokoyama, Shintaro ^a   Morioka, Hitoshi ^a   Funakubo, Hiroshi ^a,b   Yoshimoto, Mamoru ^a,b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; GAS SUPPLY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PEROVSKITE; STOICHIOMETRY; SUBSTRATES;

FLAT SUBSTRATES; PEROVSKITE LAYERS.; SOURCE GASES; SURFACE FLATNESS;

STRONTIUM COMPOUNDS;

EID: 33645520683     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2006989     Document Type: Article

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