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Volumn 49, Issue 6 PART 2, 2010, Pages

Development of extreme ultraviolet interference lithography system

(10) Fukushima, Yasuyuki a Sakagami, Naoki a Kimura, Teruhiko a Kamaji, Yoshito a Iguchi, Takafumi a Yamaguchi, Yuya a Tada, Masaki a Harada, Tetsuo a Watanabe, Takeo a Kinoshita, Hiroo a

a UNIVERSITY OF HYOGO (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM LINES; DRY-ETCH; EXTREME ULTRAVIOLET INTERFERENCE LITHOGRAPHIES; FABRICATION PROCESS; HARDMASKS; LINE-AND-SPACE; MASK PROCESS; RESIST PATTERN; SILICON DIOXIDE; SPATIAL COHERENCE LENGTH; TRANSMISSION GRATINGS; UNDULATORS; YOUNG'S DOUBLE SLIT EXPERIMENTS;

NITRIDES; PHOTORESISTS; SILICA; SILICON OXIDES; TANTALUM; TANTALUM COMPOUNDS;

LITHOGRAPHY;

EID: 77955316449 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.49.06GD06 Document Type: Article

Times cited : (8)

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