Discriminate crystallinities of tin doped indium oxide films on self-assembled monolayers modified glass substrates

Langmuir

Volumn 26, Issue 11, 2010, Pages 8251-8255

  Sharma, Jadab ^a   Chang, Hsuan Chun ^a   Tai, Yian ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS GROWTH; CRYSTALLINE FILMS; CRYSTALLINITIES; DEPOSITION CONDITIONS; DEPTH PROFILE; ELECTRICAL PROPERTY; FILM QUALITY; FOUR-POINT PROBE; GLASS SUBSTRATES; HALL MEASUREMENTS; HIGH QUALITY; HIGH TEMPERATURE; INDIUM OXIDE; ITO FILMS; LOW RESISTIVITY; LOW-TEMPERATURE DEPOSITION; POOR QUALITY FILMS; ROOM TEMPERATURE; SAMS; TERMINAL GROUPS; TIN DOPED INDIUM OXIDE FILMS; X-RAY PHOTOELECTRONS;

AMORPHOUS FILMS; ELECTRIC PROPERTIES; INDIUM; LIGHT TRANSMISSION; OPTICAL PROPERTIES; OPTOELECTRONIC DEVICES; OXIDE FILMS; SELF ASSEMBLED MONOLAYERS; SUBSTRATES; TIN; TITANIUM COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ITO GLASS;

EID: 77954560623     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la904654d     Document Type: Article

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