Effective creation of oxygen vacancies as an electron carrier source in tin-doped indium oxide films by plasma sputtering

Journal of Applied Physics

Volumn 100, Issue 11, 2006, Pages

  Luo, S N ^a,b   Kono, A ^a   Nouchi, N ^a   Shoji, F ^a  

^a KYUSHU KYORITSU UNIVERSITY   (Japan)

^b LIAONING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON MOBILITY; HALL EFFECT; INDIUM COMPOUNDS; OXYGEN; SEMICONDUCTOR DOPING; SUBSTRATES; TIN;

ELECTRON CARRIER; GLASS SUBSTRATES; INDIUM OXIDE; PLASMA SPUTTERING;

FILM GROWTH;

EID: 33845774878     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2372571     Document Type: Article

References (15)

1. R. B. H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi, J. Appl. Phys. 83, 2631 (1998).
2. J. R. Bellingham, W. A. Philips, and C. J. Adkins, J. Mater. Sci. Lett. 11, 263 (1992).
3. H. Brooks, Adv. Electron. Electron Phys. 7, 85 (1955).
4. R. B. Dingle, Philos. Mag. 46, 831 (1955).
5. G. B. Gonzales, J. B. Cohen, J.-H. Hwang, T. O. Mason, J. P. Hodges, and J. D. Jorgensen, J. Appl. Phys. 89, 2550 (2001).
6. N. Yamada, Y. Shigesato, I. Yasui, H. Li, Y. Ujihira, and K. Nomura, Hyperfine Interact. 112, 213 (1998).
7. K. Utsumi and H. IIgusa, TOSOH Res. & Technol.. 47, 11 (2003) (in Japanese).
8. I. Hamberg, C. G. Granqvist, K.-F. Berggren, B. E. Sernelius, and L. Engstrom, Phys. Rev. B 30, 3240 (1984).
9. R. Banerjee, S. Ray, N. Basu, A. K. Batabyal, and A. K. Barua, J. Appl. Phys. 62, 912 (1987).
10. J. Wellinga, W. M. Arnodbik, A. M. Vredenberg, R. E.I. Schropp, and W. F. Van der Weg, J. Phys. Chem. B 102, 6219 (1998).
11. J. P. Hirth and G. M. Pound, Prog. Mater. Sci. 11, 1 (1963).
12. C. H. Yi, Y. Shigesato, I. Yasui, and S. Takaki, Jpn. J. Appl. Phys., Part 1 34, 244 (1995).
13. S. Muranaka, Y. Bando, and T. Takada, Thin Solid Films 151, 355 (1987).
14. T. J. Vink, W. Walrave, J. L.C. Daams, P. C. Baarslag, and J. E.A.M van den Meerakker, Thin Solid Films 266, 145 (1995).
15. D. C. Paine, T. Whitson, D. Janiac, R. Beresford, C. O. Yang, and B. Lewis, J. Appl. Phys.. 12, 8445 (1999).