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Journal of Applied Physics

Volumn 107, Issue 12, 2010, Pages

Light induced solid-phase crystallization of Si nanolayers in Si/SiO 2 multiple quantum wells

(4) McHedlidze, T a,b Arguirov, T a,b Kouteva Arguirova, S a,b Kittler, M a,b

a BRANDENBURG UNIVERSITY OF TECHNOLOGY (Germany)

b IHP (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; AMORPHOUS SILICON (A-SI); INDUCED CRYSTALLIZATION; MULTIPLE QUANTUM WELLS; MULTIQUANTUM WELLS; NANO LAYERS; OPTIMAL SETS; RADIATION FLUXES; RADIATION WAVELENGTH; SOLID PHASE CRYSTALLIZATION; STRAIN-FREE; THIN SILICON FILMS;

CONVOLUTION; CRYSTALLIZATION; LIGHT SOURCES; NANOCLUSTERS; NANOCRYSTALLINE SILICON; QUANTUM WELL LASERS; RAMAN SPECTROSCOPY; SEMICONDUCTOR QUANTUM WELLS;

AMORPHOUS SILICON;

EID: 77954198814 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3446831 Document Type: Article

Times cited : (14)

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