Modelling of flash-lamp-induced crystallization of amorphous silicon thin films on glass

Journal of Crystal Growth

Volumn 285, Issue 1-2, 2005, Pages 249-260

  Smith, M ^a   McMahon, R ^a   Voelskow, M ^b   Panknin, D ^b   Skorupa, W ^b  

^a Department of Engineering ^*  (United Kingdom)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

A1. Growth models; A1. Heat transfer; A1. Recrystallization; A3. Liquid phase epitaxy; A3. Solid phase epitaxy; B2. Semiconducting silicon

Indexed keywords

ANNEALING; CRYSTALLIZATION; GLASS; HEAT TRANSFER; LIQUID CRYSTAL DISPLAYS; LIQUID PHASE EPITAXY; MATHEMATICAL MODELS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SUBSTRATES; THIN FILMS;

GLASS SUBSTRATES; GROWTH MODELS; RECRYSTALLIZATION; SOLID PHASE EPITAXY;

AMORPHOUS SILICON;

EID: 27144529952     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.08.033     Document Type: Article

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