메뉴 건너뛰기




Volumn 89, Issue 5, 2006, Pages

Residual stress in Si nanocrystals embedded in a SiO2 matrix

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAPID THERMAL ANNEALING; RESIDUAL STRESSES; SILICA;

EID: 33748453942     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2260825     Document Type: Article
Times cited : (66)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.