|
Volumn 89, Issue 5, 2006, Pages
|
Residual stress in Si nanocrystals embedded in a SiO2 matrix
|
Author keywords
[No Author keywords available]
|
Indexed keywords
COMPRESSIVE STRESS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SCATTERING;
RAPID THERMAL ANNEALING;
RESIDUAL STRESSES;
SILICA;
LASER ANNEALING;
NANOCRYSTALS;
RESIDUAL COMPRESSIVE STRESS;
NANOSTRUCTURED MATERIALS;
|
EID: 33748453942
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2260825 Document Type: Article |
Times cited : (66)
|
References (16)
|