Three-dimensional mesoscale model for the simulation of LER in photoresists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Lawson, Richard A ^a   Henderson, Clifford L ^a  

^a Georgia Institute of Technology   (United States)

Author keywords

chemically amplified photoresist; LER scaling; line edge roughness; mesoscale model; photoacid generator loading; stochastic model

Indexed keywords

CHEMICALLY AMPLIFIED PHOTORESIST; LINE EDGE ROUGHNESS; MESOSCALE MODEL; PHOTOACID GENERATOR LOADING; PHOTOACID GENERATORS;

ELECTRIC EQUIPMENT PROTECTION; LOADING; PHOTORESISTORS; ROUGHNESS MEASUREMENT; STOCHASTIC MODELS; STOCHASTIC SYSTEMS; SURFACE TREATMENT; THREE DIMENSIONAL;

PHOTORESISTS;

EID: 77953524462     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848415     Document Type: Conference Paper

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