3D simulations of the profile evolution during anisotropic wet etching of silicon

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 4233-4237

  Radjenović, Branislav ^a   Radmilović Radjenović, Marija ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Anisotropic wet etching; Level set method; MEMS; Silicon

Indexed keywords

3-D SIMULATIONS; ANGULAR DEPENDENCES; ANISOTROPIC WET ETCHING; EFFECTIVE TOOLS; LEVEL SET METHOD; LEVEL-SET EQUATIONS; PROFILE EVOLUTIONS; SILICON ETCHINGS; SPARSE FIELD METHODS; WET-ETCHING PROCESS;

ANISOTROPIC ETCHING; ANISOTROPY; CRYSTAL SYMMETRY; DROP BREAKUP; LEVEL MEASUREMENT; MEMS; MICROELECTROMECHANICAL DEVICES; NONMETALS; POTASSIUM; POTASSIUM HYDROXIDE; THREE DIMENSIONAL; THREE DIMENSIONAL COMPUTER GRAPHICS;

WET ETCHING;

EID: 65449147558     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.007     Document Type: Article

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