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Volumn 91, Issue 17, 2007, Pages

An atomic level model for silicon anisotropic etching processes: Cellular automaton simulation and experimental verification

Author keywords

[No Author keywords available]

Indexed keywords

CELLULAR AUTOMATA; COMPUTER SIMULATION; SILICON; SURFACE PROPERTIES;

EID: 35548984893     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2800884     Document Type: Article
Times cited : (3)

References (19)
  • 2
    • 33749554122 scopus 로고    scopus 로고
    • Prentice-Hall, Eaglewood Cliffs, NJ
    • C. Liu, Foundations of MEMS (Prentice-Hall, Eaglewood Cliffs, NJ, 2006), Chap 10, p. 326.
    • (2006) Foundations of MEMS , vol.10 , pp. 326
    • Liu, C.1
  • 16
    • 50149088851 scopus 로고    scopus 로고
    • Proceedings of the IEEE Sensors'06, Daegu, Korea
    • Z. F. Zhou, Q. A. Huang, W. H. Li, C. Zhu, and D. W. Xu, Proceedings of the IEEE Sensors'06, Daegu, Korea, 2006 (unpublished), pp. 1061-1063.
    • (2006)
    • Zhou, Z.F.1    Huang, Q.A.2    Li, W.H.3    Zhu, C.4    Xu, D.W.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.