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Volumn 9, Issue 2, 2000, Pages 252-261

Micromachining process simulation using a continuous cellular automata method

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; AUTOMATA THEORY; COMPUTER SIMULATION; COMPUTER SOFTWARE; PASSIVATION; REACTIVE ION ETCHING; THREE DIMENSIONAL;

EID: 0033717708     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.846706     Document Type: Article
Times cited : (77)

References (31)
  • 1
    • 0018030427 scopus 로고
    • Anisotropic etching of silicon
    • Oct.
    • K. E. Bean, "Anisotropic etching of silicon," IEEE Trans. Electron Devices, vol. ED-25, pp. 1178-1185, Oct. 1978.
    • (1978) IEEE Trans. Electron Devices , vol.ED-25 , pp. 1178-1185
    • Bean, K.E.1
  • 3
    • 0020127035 scopus 로고
    • Silicon as a mechanical material
    • May
    • K. E. Petersen, "Silicon as a mechanical material." Proc. IEEE, vol. 70, pp. 420-457, May 1982.
    • (1982) Proc. IEEE , vol.70 , pp. 420-457
    • Petersen, K.E.1
  • 4
    • 0032306316 scopus 로고    scopus 로고
    • Mass producible monolithic silicon probes for scanning probe microscopes
    • C. Liu and R. Gamble, "Mass producible monolithic silicon probes for scanning probe microscopes," Sens. Actuators, vol. 71, no. 3, pp. 233-237, 1998.
    • (1998) Sens. Actuators , vol.71 , Issue.3 , pp. 233-237
    • Liu, C.1    Gamble, R.2
  • 5
    • 0026910270 scopus 로고
    • 94-GHz integrated horn monopulse antennas
    • Aug.
    • C. G. Ling and G. M. Rebeiz, "94-GHz integrated horn monopulse antennas," IEEE Trans. Antennas Propagat., vol. 40, pp. 981-984, Aug. 1992.
    • (1992) IEEE Trans. Antennas Propagat. , vol.40 , pp. 981-984
    • Ling, C.G.1    Rebeiz, G.M.2
  • 7
    • 0030682930 scopus 로고    scopus 로고
    • Simulating the behavior of MEMS devices: Computational methods and needs
    • Jan.-Mar.
    • S. Senturia, N. Aluru, and J. White, "Simulating the behavior of MEMS devices: Computational methods and needs," IEEE Comput. Sci. Eng. Mag., vol. 4, pp. 30-43, Jan.-Mar. 1997.
    • (1997) IEEE Comput. Sci. Eng. Mag. , vol.4 , pp. 30-43
    • Senturia, S.1    Aluru, N.2    White, J.3
  • 8
    • 0030404009 scopus 로고    scopus 로고
    • From the MEMS idea to the MEMS product: CAD and foundries
    • New York, NY
    • J. M. Karam and B. Courtois, "From the MEMS idea to the MEMS product: CAD and foundries," in Proc. Wescon'96 Conf., New York, NY, pp. 73-78.
    • Proc. Wescon'96 Conf. , pp. 73-78
    • Karam, J.M.1    Courtois, B.2
  • 9
    • 0026388630 scopus 로고    scopus 로고
    • Computer simulation of anisotropic crystal etching
    • Chicago, IL
    • C. H. Sequin, "Computer simulation of anisotropic crystal etching," in Transducers'91, Chicago, IL, pp. 801-806.
    • Transducers'91 , pp. 801-806
    • Sequin, C.H.1
  • 10
    • 0040430504 scopus 로고
    • Orientation dependent dissolution of Ge
    • F. C. Frank and M. B. Ives, "Orientation dependent dissolution of Ge," J. Appl. Phys., vol. 31, pp. 1996-1999, 1960.
    • (1960) J. Appl. Phys. , vol.31 , pp. 1996-1999
    • Frank, F.C.1    Ives, M.B.2
  • 12
    • 0027666213 scopus 로고
    • A new approach for the determination of the shape of etched devices
    • Sept.
    • U. Heim, "A new approach for the determination of the shape of etched devices," J. Microelectromech. Syst., pp. 116-117, Sept. 1993.
    • (1993) J. Microelectromech. Syst. , pp. 116-117
    • Heim, U.1
  • 13
    • 0001173287 scopus 로고
    • Use of modified free energy theorems to predict equilibrium growing and etching shapes
    • R. Jaccodine, "Use of modified free energy theorems to predict equilibrium growing and etching shapes," J. Appl. Phys., vol. 33, pp. 2643-2647, 1962.
    • (1962) J. Appl. Phys. , vol.33 , pp. 2643-2647
    • Jaccodine, R.1
  • 14
    • 0001167021 scopus 로고
    • Morphology analysis in localized crystal growth and dissolution
    • D. W. Shaw, "Morphology analysis in localized crystal growth and dissolution," J. Cryst. Growth, vol. 47, pp. 509-517, 1979.
    • (1979) J. Cryst. Growth , vol.47 , pp. 509-517
    • Shaw, D.W.1
  • 15
    • 0026838886 scopus 로고
    • Anisotropic crystal etching: A simulation program
    • J. S. Danel and G. Delapierre, "Anisotropic crystal etching: A simulation program," Sens. Actuators, vol. 31, pp. 267-274, 1992.
    • (1992) Sens. Actuators , vol.31 , pp. 267-274
    • Danel, J.S.1    Delapierre, G.2
  • 16
    • 0026173595 scopus 로고
    • ASEP: A CAD program for Si anisotropic etching
    • R. A. Buser and N. F. de Rooij, "ASEP: A CAD program for Si anisotropic etching," Sens. Actuators, vol. 28, pp. 71-78, 1991.
    • (1991) Sens. Actuators , vol.28 , pp. 71-78
    • Buser, R.A.1    De Rooij, N.F.2
  • 17
    • 0343959601 scopus 로고    scopus 로고
    • SEGS: On-line WWW web etch simulator
    • Santa Clara, CA
    • G. Li, T. Hubbard, and E. K. Antonsson, "SEGS: On-line WWW web etch simulator," presented at the IEEE MSM'98, Santa Clara, CA.
    • IEEE MSM'98
    • Li, G.1    Hubbard, T.2    Antonsson, E.K.3
  • 18
    • 0030703018 scopus 로고    scopus 로고
    • Anisotropic-etching process simulation system MICROCAD analyzing complete 3D etching profiles of single crystal silicon
    • K. Asaumi, Y. Iriye, and K. Sato, "Anisotropic-etching process simulation system MICROCAD analyzing complete 3D etching profiles of single crystal silicon," in 10th Annn. IEEE Int. MEMS Workshop, 1997, pp. 412-417.
    • (1997) 10th Annn. IEEE Int. MEMS Workshop , pp. 412-417
    • Asaumi, K.1    Iriye, Y.2    Sato, K.3
  • 19
    • 0028526985 scopus 로고
    • Simulation of anisotropic chemical etching of crystalline silicon using a cellular automata model
    • O. Than and S. Buttgenbach, "Simulation of anisotropic chemical etching of crystalline silicon using a cellular automata model," Sens. Actuators, vol. A 45, pp. 85-88, 1994.
    • (1994) Sens. Actuators , vol.45 A , pp. 85-88
    • Than, O.1    Buttgenbach, S.2
  • 20
    • 0029757827 scopus 로고    scopus 로고
    • SUZANA: A 3D CAD tool for anisotropically etched silicon microstructures
    • S. Buttgenbach and O. Than, "SUZANA: A 3D CAD tool for anisotropically etched silicon microstructures," in Proc. European Design Test Conf., 1996, pp. 454-458.
    • (1996) Proc. European Design Test Conf. , pp. 454-458
    • Buttgenbach, S.1    Than, O.2
  • 21
    • 0031326056 scopus 로고    scopus 로고
    • Cellular automata in MEMS design
    • Tokyo, Japan
    • T. J. Hubbard and E. K. Antonsson, "Cellular automata in MEMS design," in Sens. Mater. Conf., vol. 7, Tokyo, Japan, 1997, pp. 437-448.
    • (1997) Sens. Mater. Conf. , vol.7 , pp. 437-448
    • Hubbard, T.J.1    Antonsson, E.K.2
  • 23
    • 0032289743 scopus 로고    scopus 로고
    • Efficient process development for bulk silicon etching using cellular automata simulation techniques
    • Santa Clara, CA, Sept.
    • J. Marchetti, Y. He, O. Than, and S. Akkaraju, "Efficient process development for bulk silicon etching using cellular automata simulation techniques," in SPIE Micromachined Devices Comp, IV Conf., Santa Clara, CA, Sept. 1998, pp. 287-295.
    • (1998) SPIE Micromachined Devices Comp, IV Conf. , pp. 287-295
    • Marchetti, J.1    He, Y.2    Than, O.3    Akkaraju, S.4
  • 24
    • 0039837881 scopus 로고    scopus 로고
    • ASECA: A cellular-automata simulation program for a silicon anisotropic super-micro-etching process in aqueous KOH
    • Jan./Feb.
    • K. Nishidate, M. Baba, and R. Gaylord, "ASECA: A cellular-automata simulation program for a silicon anisotropic super-micro-etching process in aqueous KOH," Comput. Phys., vol. 12, no. 1, pp. 88-93. Jan./Feb. 1998.
    • (1998) Comput. Phys. , vol.12 , Issue.1 , pp. 88-93
    • Nishidate, K.1    Baba, M.2    Gaylord, R.3
  • 25
    • 0041118311 scopus 로고    scopus 로고
    • Simulation of anisotropic crystalline etching using a continuous cellular automata algorithm
    • Z. Zhu and C. Liu, "Simulation of anisotropic crystalline etching using a continuous cellular automata algorithm," J. Comput. Modeling Eng. Sci., vol. 1, no. 1, pp. 11-19, 2000.
    • (2000) J. Comput. Modeling Eng. Sci. , vol.1 , Issue.1 , pp. 11-19
    • Zhu, Z.1    Liu, C.2
  • 27
    • 0030720201 scopus 로고    scopus 로고
    • Surface simplification using quadric error metrics
    • New York, NY
    • _, "Surface simplification using quadric error metrics," in Proc. SIGGRAPH'97, New York, NY, pp. 209-216.
    • Proc. SIGGRAPH'97 , pp. 209-216
  • 28
    • 0003213505 scopus 로고    scopus 로고
    • Survey of polygonal surface simplification algorithms
    • New York, NY
    • P. S. Heckbert and M. Garland, "Survey of polygonal surface simplification algorithms," presented at the Proc. SIGGRAPH'97, New York, NY.
    • Proc. SIGGRAPH'97
    • Heckbert, P.S.1    Garland, M.2
  • 31
    • 0031214943 scopus 로고    scopus 로고
    • A multichannel neural probe tor selective chemical delivery at the cellular level
    • Aug.
    • J. Chen, K. D. Wise, J. F. Hetke, and S. C. Bledsoe. "A multichannel neural probe tor selective chemical delivery at the cellular level," IEEE Trans. Bio-Med. Eng., vol. 44, pp. 760-769, Aug. 1997.
    • (1997) IEEE Trans. Bio-med. Eng. , vol.44 , pp. 760-769
    • Chen, J.1    Wise, K.D.2    Hetke, J.F.3    Bledsoe, S.C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.