Effects of temperature on microstructure and tribological performance of a-CNx films prepared by pulsed laser deposition

Materials and Manufacturing Processes

Volumn 25, Issue 5, 2010, Pages 311-315

  Zheng, X H ^a,b   Tu, J P ^a   Song, R G ^b  

^a ZHEJIANG UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Carbon nitride film; Friction and wear; Microstructure; Pulsed laser deposition

Indexed keywords

BALL-ON-DISK; C-C BONDS; CARBON NITRIDE FILMS; DEGREE OF ORDER; DEPOSITION TEMPERATURES; EFFECTS OF TEMPERATURE; FRICTION AND WEAR; FRICTION COEFFICIENTS; HUMID AIR; LOW FRICTION COEFFICIENTS; N CONTENT; PULSED-LASER DEPOSITION TECHNIQUE; RAMAN SPECTRUM; SEM; TRIBOLOGICAL PERFORMANCE; TRIBOMETERS; X RAY PHOTOELECTRON SPECTRA;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; CARBON NITRIDE; DEPOSITION; FRICTION; MICROSTRUCTURE; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; TRIBOLOGY; WEAR RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

PULSED LASERS;

EID: 77952898817     PISSN: 10426914     EISSN: 15322475     Source Type: Journal    
DOI: 10.1080/10426911003747980     Document Type: Article

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