Nano-structured CrN/CNx multilayer films deposited by magnetron sputtering

Composites Science and Technology

Volumn 68, Issue 14, 2008, Pages 2922-2929

  Vyas, A ^a   Shen, Y G ^a   Zhou, Z F ^a   Li, K Y ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

A. CrN CNx layered structures; B. Mechanical properties; D. Photoelectron spectroscopy (XPS); D. Transmission electron microscopy (TEM); D. X ray diffraction (XRD)

Indexed keywords

CHROMIUM; FILM PREPARATION; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; MICROSCOPIC EXAMINATION; MULTILAYERS; PHOTOELECTRON SPECTROSCOPY; PHOTORESISTS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SUBSTRATES; SURFACE ROUGHNESS; THICK FILMS; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

A. CRN/CNX LAYERED STRUCTURES; B. MECHANICAL PROPERTIES; D. PHOTOELECTRON SPECTROSCOPY (XPS); D. TRANSMISSION ELECTRON MICROSCOPY (TEM); D. X-RAY DIFFRACTION (XRD);

MULTILAYER FILMS;

COATING; FILM; MECHANICAL PROPERTY; MICROSTRUCTURAL ANALYSIS; SUBSTRATE; SURFACE PROPERTY;

EID: 56949085298     PISSN: 02663538     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.compscitech.2007.11.002     Document Type: Article

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