a-CN thin film properties as a function of laser ablation plasma parameters

Diamond and Related Materials

Volumn 16, Issue 4-7 SPEC. ISS., 2007, Pages 1291-1294

  Escobar Alarcon L ^a,d   Arrieta, A ^a,b   Camps, E ^a,d   Romero, S ^a   Muhl, S ^c   Camacho Lopez M A ^d  

^a INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

^b UNIVERSIDAD AUTÓNOMA METROPOLITANA   (Mexico)

^c UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^d UNIVERSIDAD AUTÓNOMA DEL ESTADO DE MÉXICO   (Mexico)

Author keywords

Amorphous carbon; Carbon nitride; Pulsed laser deposition

Indexed keywords

AMORPHOUS CARBON; CARBON NANOTUBES; CARBON NITRIDE; KINETIC ENERGY; LASER ABLATION; LASER PRODUCED PLASMAS; PULSED LASER DEPOSITION;

KINETIC ION ENERGY; PLASMA PARAMETERS; THIN FILM PROPERTIES;

THIN FILMS;

EID: 34047250638     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.11.022     Document Type: Article

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