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Surface Engineering

Volumn 16, Issue 3, 2000, Pages 221-224

Formation of β-C3N4 grains by sputtering

(2) Wei, J a Hing, P b

a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; FILM GROWTH; MAGNETRON SPUTTERING; MORPHOLOGY; NITRIDES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SPUTTER DEPOSITION; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL);

CARBON NITRIDES;

CARBON INORGANIC COMPOUNDS;

EID: 0033703950 PISSN: 02670844 EISSN: None Source Type: Journal
DOI: 10.1179/026708400101517189 Document Type: Article

Times cited : (5)

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