Structural characterization of multi-quantum wells in electroabsorption- modulated lasers by using synchrotron radiation micrometer-beams

Advanced Materials

Volumn 22, Issue 18, 2010, Pages 2050-2054

  Mino, Lorenzo ^a   Gianolio, Diego ^a   Agostini, Giovanni ^a   Piovano, Andrea ^a   Truccato, Marco ^a   Agostino, Angelo ^a   Cagliero, Stefano ^a   Martinez Criado, Gema ^b   Codato, Simone ^c   Lamberti, Carlo ^a  

^a UNIVERSITY OF TURIN   (Italy)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c BROADCOM CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHIP-LEVEL; DIRECT MEASUREMENT; ELECTRO-ABSORPTION MODULATED LASER; HIGH FREQUENCY HF; MONOLITHIC INTEGRATION; MULTIQUANTUM WELLS; OPTICAL FIBER COMMUNICATION; SELECTIVE AREA GROWTH TECHNIQUES; STRUCTURAL CHARACTERIZATION; STRUCTURAL PARAMETER; SYNCHROTRON RADIATION SOURCE; THIRD GENERATION; X RAY BEAM;

MICROMETERS; MONOLITHIC INTEGRATED CIRCUITS; OPTICAL COMMUNICATION; OPTICAL FIBERS; OPTOELECTRONIC DEVICES; QUANTUM OPTICS; SEMICONDUCTOR QUANTUM WELLS; SYNCHROTRON RADIATION; SYNCHROTRONS;

QUANTUM WELL LASERS;

SILICON DIOXIDE;

ABSORPTION; ARTICLE; CHEMISTRY; LASER; QUANTUM THEORY; SYNCHROTRON;

ABSORPTION; LASERS; QUANTUM THEORY; SILICON DIOXIDE; SYNCHROTRONS;

EID: 77952797616     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.200903407     Document Type: Article

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