Microbeam high-resolution diffraction and x-ray standing wave methods applied to semiconductor structures

Journal of Physics D: Applied Physics

Volumn 37, Issue 4, 2004, Pages

  Kazimirov, A ^a   Bilderback, D H ^a   Huang, R ^a   Sirenko, A ^b   Ougazzaden, A ^c  

^a Department of Obstetrics Gynecology   (United States)

^b NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^c SUPELEC   (France)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH RESOLUTION DIFFRACTION; ONE BOUNCE IMAGING CAPILLARY; SEMICONDUCTOR STRUCTURES; X RAY MICROBEAMS; X RAY STANDING WAVE METHODS;

EPITAXIAL GROWTH; IMAGE QUALITY; OPTICAL COLLIMATORS; OPTICS; SCATTERING; SEMICONDUCTING INDIUM COMPOUNDS; STRAIN; X RAY DIFFRACTION ANALYSIS;

SEMICONDUCTOR MATERIALS;

EID: 1442360630     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/4/L01     Document Type: Letter

References (24)

1. Bowen D K and Tanner B K 1998 High Resolution X-Ray Diffractometry and Topography (London: Taylor and Francis)
2. Holý V, Pietsch U and Baumbach T 1999 High-Resolution X-Ray Scattering from Thin Films and Multilayers (Springer Tracts in Modern Physics) p 149
3. Zegenhagen J 1993 Surf. Sci. Rep. 18 199
4. Riekel C 2000 Rep. Prog. Phys. 63 233-62
5. Eastman D E, Stagarescu C B, Xu G, Mooney P M, Jordan-Sweet J L, Lai B and Cai Z 2002 Phys. Rev. Lett. 88 156101
6. Cai Z-H et al 1999 Appl. Phys. Lett. 75 100
7. Tsusaka Y, Yokoyama K, Takeda S, Urakawa M, Kagoshima Y, Matsui J, Kimura S, Kimura H, Kobayashi K and Izumi K 2000 Japan. J. Appl. Phys. 39 L635
8. Kimura S et al 2000 Appl. Phys. Lett. 77 1286
9. Yokoyama K et al 2002 Japan. J. Appl. Phys. 41 6094
10. Matsui J, Tsusaka Y, Yokoyama K, Takeda S, Urakawa M, Kagoshima Y and Kimura S 2002 J. Cryst. Growth 237-239 317
11. Drakopoulas M, Zegenhagen J, Snigirev A, Snigireva I, Hauser M, Eberl K, Aristov V, Shabelnikov L and Yunkin V 2002 Appl. Phys. Lett. 81 2279
12. Bilderback D H and Fontes E 1997 AIP Conf. Proc. 417 147
13. Attwood D 1999 Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge: Cambridge University Press)
14. Mason B et al 2002 IEEE Phot. Tech. Lett. 14 27
15. Sudo S, Kudo K, Mori K and Sasaki T 2001 Conf. Proc. International Conf. on InP and Related Materials (IPRM'2001) p 390
16. Gibbon M, Stagg J P, Cureton C G, Thrush E J, Jones C J, Mallard R E, Pritchard R E, Collis N and Chew A 1993 Semicond. Sci. Technol. 8 998
17. Alam M et al 1999 Appl. Phys. Lett. 74 2617
18. Sirenko A A, Reynolds C L, Peticolas L J, Ougazzaden A, Kazimirov A, Huang R, Fontes E and Bilderback D 2003 J. Cryst. Growth 253 38
19. Batterman B W 1969 Phys. Rev. Lett. 22 703
20. Andersen S K, Golovchenko J A and Mair G 1976 Phys. Rev. Lett. 37 1141
21. Kohn V G and Kovalchuk M V 1981 Phys. Status Solidi a 64 359
22. Kazimirov A Yu, Kovalchuk M V and Kohn V G 1988 Sov. Tech. Phys. Lett. 14 587
23. Kazimirov A, Zegenhagen J and Cardona M 1998 Science 282 930
24. Kohn V G 2002 Phys. Status Solidi b 231 132