Preferred orientations in nano-gold/silica/silicon interfaces

Applied Surface Science

Volumn 256, Issue 16, 2010, Pages 4915-4923

  Vasisht, Sanjeev ^a   Shirokoff, John ^a  

^a MEMORIAL UNIVERSITY OF NEWFOUNDLAND   (Canada)

Author keywords

AFM; Nano micro crystals; Pole figures; Preferred orientations; SEM; Solid solid interfaces; XRD

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON OXIDES; THERMAL EVAPORATION; TWINNING;

AMORPHOUS OXIDE LAYERS; ANNEALING TEMPERATURES; CLOSE-PACKED PLANES; EXPERIMENTAL EVIDENCE; ORIENTATION DISTRIBUTIONS; POLE FIGURE; PREFERRED ORIENTATIONS; SOLID-SOLID INTERFACES;

SUBSTRATES;

EID: 77950917173     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.02.090     Document Type: Article

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