Structural evolution and atomic structure of ultrahigh vacuum deposited Au thin films on silicon at low temperatures

Applied Surface Science

Volumn 92, Issue , 1996, Pages 507-512

  Chen, C R ^a   Chen, L J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; AMORPHOUS MATERIALS; ANNEALING; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; INTERFACES (MATERIALS); LOW TEMPERATURE EFFECTS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON WAFERS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

STRUCTURAL EVOLUTION; ULTRAHIGH VACUUM DEPOSITION;

GOLD;

EID: 0030562373     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00286-3     Document Type: Article

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