Structural and elastic characterization of Cu-implanted SiO2 films on Si(100) substrates

Journal of Applied Physics

Volumn 101, Issue 4, 2007, Pages

  Shirokoff, J ^a   Young, C K ^a   Brits, L C ^a   Andrews, G T ^a   Johannessen, B ^b   Ridgway, M C ^b  

^a MEMORIAL UNIVERSITY OF NEWFOUNDLAND   (Canada)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVE VELOCITY; BRILLOUIN SCATTERING; COPPER; ION IMPLANTATION; NANOCRYSTALLITES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

BULK ACOUSTIC MODES; SPHERICAL NANOCRYSTALLITES; UNIMPLANTED FILMS; X-RAY METHODS;

THIN FILMS;

EID: 33847631648     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2437690     Document Type: Article

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