Kinetic mechanism of the thermal-induced self-organization of Au/Si nanodroplets on Si(100): Size and roughness evolution

Journal of Applied Physics

Volumn 104, Issue 2, 2008, Pages

  Ruffino, F ^a   Canino, A ^a   Grimaldi, M G ^a   Giannazzo, F ^b   Roccaforte, F ^b   Raineri, V ^b  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; DIFFUSION IN SOLIDS; DROP FORMATION; DROPS; FLUID MECHANICS; GOLD; MICROSCOPIC EXAMINATION; PARAMETER ESTIMATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING PROBE MICROSCOPY; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTOR DOPING; SILICON; SPUTTER DEPOSITION; SURFACE DIFFUSION; THICK FILMS; THREE DIMENSIONAL;

AFM MEASUREMENTS; ANNEALING TIME; AU LAYER; AU THIN FILMS; CENTER DISTANCE; DIFFUSION CO-EFFICIENT; DROPLET CLUSTERING; DROPLET DENSITY; DROPLET SIZE DISTRIBUTIONS; DYNAMIC SCALING; ELECTRON MICROSCOPY.; EXPERIMENTAL DATA; KINETIC MECHANISMS; NANO-DROPLETS; RIPENING PROCESS; ROUGHNESS EVOLUTION; RUTHERFORD BACKSCATTERING SPECTROMETRY; SELF ORGANIZATIONS; SI(100); SPUTTERING TECHNIQUES; THREE-DIMENSIONAL STRUCTURING;

IMAGING TECHNIQUES;

EID: 48949098056     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2955784     Document Type: Article

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